Mask transmission assembly and photoetching system
A technology for transporting components and reticles, which is applied in the field of reticle transporting components and photolithography systems, and can solve the problems of high loading height of the plate box and unfriendly material box height, etc.
Pending Publication Date: 2022-04-05
BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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Problems solved by technology
[0003] The loading height of the stencil box in the prior art is relatively high. Since the mask table is located on the top of the equipment, in order to simplify the mechanical structure, the loading height of the stencil box is at the same height as the mask table, and it is not friendly to manually place the box height
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[0026] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.
[0027] An embodiment of the present invention provides a reticle transport component, such as figure 1 As shown, it includes a first version library 1 , a second version library 3 , a first manipulator 2 and a second manipulator 4 .
[0028] The first reticle library 1 is used to carry a reticle (not shown in the figure), and the target reticle is stored in the reticle box, and the first reticle library 1 is connected to a first li...
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The invention discloses a mask plate transmission assembly and a photoetching system, and the mask plate transmission assembly comprises a first plate library used for bearing a plate box, the first plate library is connected with a first lifting structure, and a target mask plate is transmitted to a first handover station through the first lifting structure; the first manipulator is configured to obtain the target mask plate at the first handover station and put the target mask plate into the second mask plate library; the second plate library is used for bearing a target mask plate, the second plate library is connected with a second lifting structure so as to realize movement between the first handover station and a second handover station through the second lifting structure, the second handover station is provided with a second high layer, and the second high layer is higher than the first high layer; and the second manipulator is configured to take out the target mask plate from the second plate library at the second handover station and transmit the target mask plate to the mask table of the photoetching machine. According to the mask plate transmission assembly and the photoetching system disclosed by the invention, through cooperation of the first plate library and the second plate library which can be lifted, friendly feeding is realized, and meanwhile, the transfer efficiency of the mask plate is improved.
Description
technical field [0001] The invention relates to the technical field of semiconductors, in particular to a reticle transport component and a photolithography system. Background technique [0002] The mask plate is an indispensable material in the photolithography process. The mask plate bears the design pattern, and the light passes through the pattern to project the design pattern on the wafer. Mask transfer is the process of loading reticles from a magazine to a mask table, or unloading from a mask table to a magazine. Materials are transported with certain attributes, such as position accuracy, temperature, and cleanliness. At the same time, in order to achieve production capacity, masks are required to be able to switch quickly. GKJ with advanced manufacturing processes has a large volume, complex internal structure, and precision parts such as objective lenses, workpiece tables and The alignment system is located in the central area of the equipment, and the maintaina...
Claims
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IPC IPC(8): G03F7/20
Inventor 王浩楠关宏武郎平林继柱佀海燕温鹏
Owner BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC