Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photoresist, display panel and manufacturing method of display panel

A technology of photoresist and substrate, which is applied in the photoplate-making process of the patterned surface, photosensitive materials used in optomechanical equipment, optics, etc., can solve problems such as the loss of brightness of the retaining wall, so as to improve brightness and light utilization efficiency Effect

Pending Publication Date: 2022-04-08
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of brightness loss caused by existing retaining walls

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoresist, display panel and manufacturing method of display panel
  • Photoresist, display panel and manufacturing method of display panel
  • Photoresist, display panel and manufacturing method of display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.

[0038] The photoresist provided by the present invention introduces highly reflective metal balls into the transparent colloid, thereby endowing the transparent colloid with light reflection properties, because the reflectivity of the metal balls is much higher than that of commonly used reflective materials, such as scattering particles such as titanium dioxide Therefore, the photoresist has strong light reflection ability, and can reflect rather than absorb the li...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a photoresist, a display panel and a manufacturing method of the display panel, according to the photoresist, metal balls with high reflectivity are introduced into transparent colloid, so that the transparent colloid is endowed with light reflection performance, and because the reflectivity of the metal balls is far higher than that of common reflecting materials such as scattering particles such as titanium dioxide, the light reflection performance of the transparent colloid is greatly improved. Therefore, the light reflection capability of the photoresist is relatively strong, and light emitted by the quantum dot film layer can be reflected instead of being absorbed, so that the light utilization efficiency can be improved, and the brightness of the quantum dot display panel is further improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photoresist, a display panel and a method for manufacturing the display panel. Background technique [0002] According to different light emitting mechanisms, quantum dot displays can be divided into two types: photoluminescence display and electroluminescence display. At present, the development of photoluminescent quantum dot display is relatively mature, especially the display represented by quantum dot backlight film has entered the market. Due to the advantages of narrow half-peak width, high fluorescence quantum efficiency (PLQY) and adjustable emission wavelength of quantum dot materials, the display quality is excellent and the color gamut is high. Different from quantum dot backlight, quantum dot color film technology is a new generation of quantum dot display mode. It is mainly to combine red and green quantum dot color films with blue OLED, mini LED or micro LED b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/027G03F7/004G02F1/13357G09F9/30
Inventor 段淼邵冬梅侯俊陈黎暄
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com