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Plating solution analysis system and dosing device

A technology of a dosing device and an analysis system, which is applied in the fields of analyzing materials, measuring devices, and material analysis by electromagnetic means, can solve the problems that the channels cannot be fully utilized, exceed the number of types, and the precision syringes are expensive. The effect of analyzing time, improving work efficiency, and high dosing efficiency

Pending Publication Date: 2022-04-15
深圳日山科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] The first solution needs to prepare more than ten cups of support solution in advance, which is labor-intensive; configuring the corresponding support solution on the software also requires the knowledge and care of technicians; the large turntable takes up space and makes the instrument look cumbersome;
[0015] The second solution requires a lot of precision syringes to realize the automatic analysis of multiple components of the plating solution, and precision syringes are very expensive
When the first automatic controllable multi-way valve and the second automatic controllable multi-way valve adopt the same multi-way valve, that is, the number of channels of the two multi-way valves is the same (for example, the first automatic controllable multi-way valve and the second automatic controllable multi-way valve The number of channels of the controllable multi-way valve is 8), and when the number of samples to be analyzed is large, the following situation may exist: the first automatic controllable multi-way valve that cooperates with a small-capacity precision syringe and is responsible for adding samples / medicine The number of channels that the valve can provide cannot meet the test requirements of a large number of samples, while the number of channels that can be provided by the second automatic controllable multi-way valve that is matched with a large-capacity precision syringe and is responsible for adding support solution (electroplating mother solution) exceeds This will cause the channels of the two multi-way valves to not be fully utilized during the automatic test, and the number of samples that can be arranged for automatic testing at one time is completely controlled by the first automatic controllable multi-way valve. The number of channels of the through valve is limited

Method used

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  • Plating solution analysis system and dosing device
  • Plating solution analysis system and dosing device
  • Plating solution analysis system and dosing device

Examples

Experimental program
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Effect test

no. 1 example

[0048] refer to figure 1 , this embodiment provides a plating solution analysis system. The plating solution analysis system includes a dosing device 100 , a potentiostat 200 , a computer 300 , an electrolyte analysis container 400 , a waste liquid container 500 , multiple electrodes 600 and multiple liquid containers 700 .

[0049] A plurality of electrodes 600 are located in the electrolyte analysis container 400 and can be connected to the potentiostat 200 . The computer 300 may specifically be a personal computer, and may process the data transmitted from the potentiostat 200 .

[0050] The waste liquid container 500 is used to accommodate waste liquid.

[0051] The liquid placed in each liquid container 700 includes one of plating solution sample, brightener, standard sample, electroplating mother solution, deionized water, chloride ion titration reagent, acid titration reagent, wetting agent and copper titration reagent.

[0052] refer to figure 1 , the dosing device...

no. 2 example

[0069] refer to Figure 4 The difference between this embodiment and the first embodiment is that: the large-capacity automatic controllable precision dosing unit 3 of the first embodiment includes a second automatic controllable multi-way valve 3A and a large-capacity automatic controllable precision syringe 3B; The large-capacity automatic controllable precision dosing unit 3 of the embodiment includes three peristaltic pumps. refer to Figure 4 , one side channel of a peristaltic pump is used as the second waste liquid discharge channel 31 , and the other side channel is used as the waste liquid suction channel 800 .

[0070] One side channel of the other two peristaltic pumps is used as the second liquid suction channel 32 , and the other side channel is used as the second liquid discharge channel 33 .

[0071] The controller 4 makes the three peristaltic pumps work respectively by controlling three driving mechanisms including motors, so as to realize suction and discha...

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Abstract

The invention relates to a plating solution analysis system and a dosing device, which comprise a small-capacity automatic controllable precision injector, a large-capacity automatic controllable precision injector, a first automatic controllable multi-way valve, a second automatic controllable multi-way valve and a multi-port switching valve, and the small-capacity automatic controllable precision injector and the large-capacity automatic controllable precision injector can pass through the multi-port switching valve. And one of the public channel of the first automatic controllable multi-way valve and the public channel of the second automatic controllable multi-way valve is selected to be connected. The dosing device can fully utilize the configuration of the large injector and the small injector, so that the large injector and the small injector are responsible for filling liquid medicine with corresponding volumes, the dosing efficiency is higher, and the automatic analysis time is shortened. Moreover, the dosing device can fully utilize the number of channels of the first automatic controllable multi-way valve and the second automatic controllable multi-way valve, so that more samples can be automatically tested at one time.

Description

technical field [0001] The present application relates to the technical field of plating solution analysis, in particular to a plating solution analysis system and a dosing device. Background technique [0002] At present, the concentration analysis of the components of the plating solution, especially the concentration analysis of the additives of the plating solution, is most commonly used by Cyclic Voltammetry Stripping (CVS technology for short). The technique determines the concentration of a sample by measuring its response to the deposition rate of electroplating on a rotating disk electrode. [0003] The general steps for using CVS technology are: [0004] 1) Prepare a cup (for example, 100ml) of a support solution, which is usually an additive-free electroplating mother solution or a plating solution containing a specific additive with a known concentration; [0005] 2) Set the CVS technical parameters, and test the electroplating deposition rate index of the supp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N35/10G01N27/416C25D21/14
CPCG01N35/1011G01N27/416C25D21/14
Inventor 孙耀峰周卫娟
Owner 深圳日山科技有限公司
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