Positioning device and diffusion furnace
A technology for positioning devices and diffusion furnaces, which is applied in the directions of diffusion/doping, transportation and packaging, and final product manufacturing. It can solve problems such as position errors, collision furnace tubes, and adding carbon-silicon paddles, so as to correct position errors and avoid collisions. Effect
Pending Publication Date: 2022-05-20
青岛惠科微电子有限公司 +2
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Problems solved by technology
[0002] Before the diffusion furnace works, it is usually necessary to adjust the position of the carbon-silicon paddle to ensure that the carbon-silicon paddle will not collide with the furnace tube during the movement and cause the silicon wafer to break, but the carbon-silicon paddle has been adjusted under no-load condition. The position of the carbon-silicon paddle will often drop due to the force of the wafer being lifted by the front section of the carbon-silicon paddle after loading, which leads to a position error between the adjusted position of the carbon-silicon paddle before no load and the position after loading. , increasing the chance of the carbon silicon paddle colliding with the furnace tube
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[0022] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.
[0023] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.
[0024] Al...
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The invention discloses a positioning device and a diffusion furnace. An adjusting mechanism comprises a fixing support, an angle adjusting device, an angle sensor, a calculation module and a control device. The fixing support is rotatably connected with the base through the angle adjusting device, one end of the carbon silicon paddle is horizontally connected with the fixing support, and the control device is arranged on the base and connected with the angle adjusting device. The angle sensor and the calculation module are both arranged on the fixing support, the angle sensor is connected with the calculation module, and the calculation module is connected with the control device. The angle sensor is used for recording the angle of the carbon-silicon paddle when the quartz boat is unloaded and the angle of the carbon-silicon paddle after the quartz boat is loaded with a silicon wafer; the calculation module is used for calculating an angle difference value of the carbon silicon paddle when the quartz boat is unloaded and after the silicon wafer is loaded, and transmitting a signal to the control device; the control device controls the angle adjusting device to lift the fixing support by a preset angle, and the preset angle is equal to the angle difference value. The feeding device can correct the position error of the carbon silicon paddle before and after feeding.
Description
technical field [0001] The present application relates to the technical field of semiconductors, in particular to a positioning device and a diffusion furnace. Background technique [0002] Before the diffusion furnace works, it is usually necessary to adjust the position of the carbon-silicon paddle to ensure that the carbon-silicon paddle will not collide with the furnace tube during the movement and cause the silicon wafer to break, but the carbon-silicon paddle has been adjusted under no-load condition. The position of the carbon-silicon paddle will often drop due to the force of the wafer being lifted by the front section of the carbon-silicon paddle after loading, which leads to a position error between the adjusted position of the carbon-silicon paddle before no load and the position after loading. , which increases the chance of the carbon-silicon paddle colliding with the furnace tube. [0003] How to correct the position error of the carbon-silicon paddle before a...
Claims
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Login to View More IPC IPC(8): H01L21/68H01L21/677C30B31/00
CPCH01L21/681H01L21/67763C30B31/00Y02P70/50
Inventor 宋修扬孙军旗赵利孙玉群
Owner 青岛惠科微电子有限公司