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Method and device for measuring interfacial force between nanowire and substrate

A technology of measuring devices and measuring methods, applied in the direction of measuring devices, measuring forces, instruments, etc., to achieve the effect of high coincidence

Pending Publication Date: 2022-07-01
CHANGSHU INSTITUTE OF TECHNOLOGY
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] In view of the above-mentioned defects in the prior art, the task of the present invention is to provide a method for measuring the interfacial force between the nanowire and the substrate to solve the problem of real-time continuous measurement of the interfacial force between the nanowire and the substrate under the influence of liquid. Another aspect of the present invention is The task is to provide a device for measuring the interfacial force between the nanowire and the substrate

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  • Method and device for measuring interfacial force between nanowire and substrate
  • Method and device for measuring interfacial force between nanowire and substrate
  • Method and device for measuring interfacial force between nanowire and substrate

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Embodiment Construction

[0020] The present invention will be further described below in conjunction with the examples, but it is not intended to limit the present invention.

[0021] Example, please combine Figure 1 to Figure 2 As shown, the contact resistance measurement circuit between the nanowire and the substrate involved in this embodiment is composed of a substrate 1 and a CuNW nanowire 2. The material of the substrate 1 can be gold-plated glass, polypyrrole film, FTO glass or RGO film to ensure its conductivity. . In this embodiment, the substrate 1 is made of FTO glass, and the substrate 1 forms the first part 101 and the second part 102 by brittle fracture and splicing again. After splicing, a gap 103 of 5-15 μm is set between the first part 101 and the second part 102 so that the first part 101 and the second part 102 form a circuit break, that is, the first part 101 and the second part 102 are not conductive to each other at this time. . When the substrate 1 is plated with a conductiv...

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Abstract

The invention discloses a method for measuring interfacial force between a nanowire and a substrate, which comprises the following steps of: placing a contact resistance measuring circuit between the nanowire and the substrate in liquid to measure a contact circuit between the nanowire and the substrate under positive pressure generated by liquid with different depths; further determining a relation parameter between the interface acting force between the nanowire and the substrate and the contact resistance, and then measuring the contact resistance between the nanowire and the substrate to obtain the corresponding interface acting force. The invention also discloses a corresponding device for measuring the interfacial force between the nanowire and the substrate. According to the invention, on the basis of the force-electricity relationship, continuous real-time measurement of the nano-mechanical property between the nanowire and the substrate is realized, and an effective guarantee is provided for exploring the influence rule of the nano-mechanical property.

Description

technical field [0001] The invention relates to a nanomechanical measurement method and device, in particular to a method and device for measuring the interface force between nanowires and a substrate. Background technique [0002] Nanomechanics, as a branch of nanotechnology, focuses on the application of engineering nanostructures and mechanical properties of nanosystems. Nanomechanics not only dominates the mechanical properties of materials, but also has a significant impact on the magnetic, electrical, and optical properties of materials. If the nanomechanical properties of materials can be regulated, it means that multiple properties of materials can be regulated at the same time. At present, the technology of nanomechanical measurement mainly focuses on the static research of the mechanical properties of nanomaterials. The existing measurement instruments mainly include tribo atomic force microscope, Raman spectroscopy and self-made equipment. Among them, the frictio...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/04G01L1/20
CPCG01N27/045G01L1/20
Inventor 曹振兴梁凤芝黄涛王均溢杨溢王一鸣魏勇李文建
Owner CHANGSHU INSTITUTE OF TECHNOLOGY
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