Double-sided conductive laminated structure and manufacturing method thereof
A technology of laminated structure and manufacturing method, applied in the direction of printed circuit manufacturing, printed circuit, electrical components, etc., can solve the problems of electroless plating thickness selectivity, process unevenness, etc., and achieve the effect of solving the problem of electroless plating thickness selectivity
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[0050] The above description about the content of the present invention and the following embodiments are used to demonstrate and explain the spirit and principle of the present invention, and provide further explanation of the scope of the patent application of the present invention. With regard to the features, implementations and effects of the present invention, preferred embodiments are described in detail as follows in conjunction with the drawings.
[0051] As mentioned in the previous prior art, due to the multi-layer structure used in the prior art, serious problems such as smear and drilling contamination will be generated during the drilling process, and at the same time, it will also occur in the electroless plating process. Missing such as poor uniformity and selectivity differences. Therefore, based on the improvement of these defects, the present invention proposes a better improved design for these various problems, which is an innovative double-sided conductiv...
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