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Chemical raw material dispensing system

A chemical raw material and a new type of technology, applied in the direction of gaseous chemical plating, chemical instruments and methods, and from chemically reactive gases, etc., can solve the problems of increasing equipment operating liquidity, increasing equipment costs, multi-material bottles, etc.

Inactive Publication Date: 2006-05-31
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Obviously, such a raw material distribution system, on the one hand, increases the equipment cost due to too many raw material distribution systems, and on the other hand, increases the working capital of the equipment operation because too many raw material bottles are needed

Method used

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Examples

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Effect test

Embodiment 1

[0038] refer to image 3 (the same parts of the present invention use the same label), wherein the raw material bottles 20, 20' are more than two, each with a pressure controller 30 connected thereto, and the outlets of the raw material bottles 20 are respectively connected with more than two flow control devices. The flow controller 10 is connected to a material growth chamber 40 respectively. In a certain device, two channels of trimethylgallium and two channels of trimethylindium are required. Wherein trimethylgallium raw material bottle 20 (the connection relation of raw material bottle 20 and flow controller 10 and pressure controller 30 and figure 2 Similarly), a downstream pressure controller 30 is used to deliver the carrier gas (through the pipeline) to the raw material bottle to control the pressure in the raw material bottle 20 . In addition, the flow controller 10 is used to control the flow of the carrier gas output from the raw material bottle 20, and the two ...

Embodiment 2

[0045] refer to Figure 4 , wherein there are more than two raw material bottles 20, 20', each having a pressure controller 30 connected thereto, and the outlets of the raw material bottles 20 are respectively connected with more than two flow controllers 10, and the flow controllers 10 are respectively connected to Enter more than two material growth chambers 40. In a certain semiconductor manufacturing equipment, there are two semiconductor material growth chambers 40 . Each growth chamber 40 requires one channel of trimethylgallium and one channel of trimethylindium. Among them, the trimethylgallium raw material bottle 20 uses a downstream pressure controller 30 (through a pipeline) to deliver carrier gas to the raw material bottle to control the pressure in the trimethylgallium raw material bottle 20 . In addition, the flow controller 10 is used to control the flow of the carrier gas output from the trimethylgallium raw material bottle 20, and the two flow controllers 10...

Embodiment 3

[0054] refer to Figure 5 , wherein the outlet of the raw material bottle 20 has a pressure gauge 50, and the pressure gauge 50 controls the flow rate of the flow controller 10. In a certain device, two channels of trimethylgallium are required. Use a flow controller (through the pipeline) to deliver the carrier gas to the trimethylgallium raw material bottle 20, and at the outlet side of the raw material bottle, use a pressure gauge 50 to measure the pressure in the raw material bottle. The pressure signal measured by the pressure gauge 50 is fed back to the flow controller 10. If the pressure in the raw material bottle is higher than a certain set value, the input of carrier gas to the raw material bottle is reduced or even stopped. If the pressure in the raw material bottle is lower than a certain set value, then increase the flow rate of carrier gas input into the raw material bottle. This controls the pressure in the raw material bottle. In addition, the flow controlle...

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PUM

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Abstract

The present invention is a new distribution system for chemical raw materials, including a raw material bottle, a pressure controller, and a flow controller, wherein: the inlet of the raw material bottle is connected to one end of the pressure controller through a pipeline, and the pipeline extends into the bottom of the raw material bottle ; The other end of the pressure controller is connected to the carrier gas adding end through a pipeline; the outlet of the raw material bottle is connected to one end of a plurality of flow controllers through a pipeline, and the pipeline extends into the upper part of the raw material bottle; The other ends of the controller are respectively connected with pipelines, which are respectively raw material outlets, and the raw material outlets are respectively connected to the material growth chamber.

Description

technical field [0001] The invention provides a new distribution system for chemical raw materials, in particular to a material growth device that needs to use carrier gas to transport raw materials. Background technique [0002] According to the type of material growth equipment, it includes metal-organic chemical vapor deposition (Metal-Organic Chemical Vapor Deposition, referred to as MOCVD, the same below), and this equipment has another name: metal-organic chemical vapor phase epitaxy (Metal-Organic Vapor Phase Epitaxy, referred to as MOVPE), also includes chemical beam epitaxy (Chemical Beam Epitaxy, referred to as CBE, the same below) and any material growth equipment that needs to transport raw materials with carrier gas. [0003] According to the form of raw materials, it includes liquid raw materials, solid raw materials, etc. Commonly used liquid raw materials are: trimethylgallium, triethylgallium, trimethylaluminum, triethylaluminum, ethyldimethylindium, trieth...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C30B25/14
Inventor 刘祥林
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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