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Developing device and method

A developing device and developing solution technology, which is applied in photography, optics, instruments, etc., can solve the problems of prolonged developing time, difficulty in maintaining the performance of developing solution, and reduced developing speed, so as to achieve compact developing device, prevent poor developing phenomenon, and save consumption Effect

Inactive Publication Date: 2006-07-05
TOKYO OHKA KOGYO CO LTD
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  • Abstract
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Problems solved by technology

[0006] However, the above-mentioned developing device has such a problem that coating a thick film resist of 10 μm or more on the object to be processed will prolong the development time and reduce the development speed. The problem that the entire device must be enlarged
In addition, when the developer is supplied by spraying water, the specified temperature can be maintained until the moment the developer is discharged, but the temperature and concentration of the developer after discharge will change due to evaporation, and it is difficult to maintain the specified performance of the developer. Unevenness

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Embodiment Construction

[0030] Next, embodiments of the present invention will be described. FIG. 1 is a configuration diagram of an immersion type developing device of the present invention. The developing device has a developer solution quantitative holding unit 1 for temporarily storing and supplying the developer solution. The developer solution quantitative holding unit 1 is inserted with a temperature sensor 2 for detecting the temperature of the developer solution, a water level detection sensor 3 for detecting the water level of the developer solution, and an introduction The developing solution introduction pipe 4 for the developing solution.

[0031] The developing device has a developing tank 5 formed by connecting the developing tank 5 and the developer solution quantitative holding part 1 together. In the embodiment shown in FIG. 1 , an observation window 6 is provided on a part of the developing tank 5 . The observation window 6 may be a transparent window made of glass or plastic. I...

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Abstract

The invention provides a compact developing device and a developing method by which a developing time of thick-film resist can be reduced and a large object to be treated be developed. This developing device is designed to adjust the temperature of a developer supplied from a developer supply tank through a heat exchanger and to supply it to a developing tank. An object to be treated is vertically held in the developing tank for single sheet processing, and a temperature-adjusted developer is circulated in the developing device.

Description

technical field [0001] The present invention relates to a development treatment device and a development treatment method, in particular to a development treatment device and a development method for supplying a developer solution maintained at a constant temperature onto the surface of a substrate to be treated coated with a photosensitive resin with a thickness of 10 μm or more and performing development treatment . Background technique [0002] As is well known, in the past, a photosensitive resin is coated on the substrate to be processed such as an existing semiconductor plate, and a circuit pattern is copied on the photosensitive resin by photocopying technology, and a developer is supplied to the pattern forming surface to apply a resist. The latent image pattern of the film is developed, thereby forming a circuit on the surface of the processed substrate. [0003] However, in recent years, the line width of a circuit pattern has been narrowed along with an increase ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/30H01L21/027
CPCG03F7/3028G03F7/70875
Inventor 中村彰彦宫成淳
Owner TOKYO OHKA KOGYO CO LTD