Optically active waveguide device comprising a channel on an optical substrate
A technology for active devices and substrates, which is applied to optical waveguides, coupling of optical waveguides, structures of optical waveguide semiconductors, etc., and can solve problems such as damage to the optical specifications of the waveguide channels and difficulties in the lithography stage.
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[0042] First, to simplify the presentation of the present invention, only the implementation of the active waveguide channel core is described.
[0043] As shown in Figure 1a, according to a first variant, the substrate is silicon, on which there is an insulating layer, either with the addition of a thermal oxide or with the deposition of a silicon dioxide SiO 2 layer or another material layer such as Si 3 N 4 、Al 2 o 3 or SiON. Here is generally an electrical or optical medium as opposed to a charged active ionic glass. But it is impossible to guarantee that there are absolutely no mobile ions in these materials. It can only be determined that its active ion concentration is quite small, such as less than 0.01%.
[0044] Thus, the substrate has a top surface or optical substrate 11, typically silicon dioxide, with a thickness of eg 5 to 20 microns. Here, the channel 12 formed by ion implantation is integrated in the optical substrate, and the optical substrate is cover...
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Abstract
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