Method for realizing silicon based silicon dioxde waveguide polarization irrelevancy by employing non-planar process
A silicon dioxide, non-planar technology, applied in the direction of optical waveguide light guide, light guide, optics, etc., can solve the problem of polarization insensitivity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0022] see image 3 , Figure 3-1 , image 3 -2 is to perform reactive ion etching (RIE) on the silicon substrate 11 first, etch out the square waveguide core space 12, the space width is 22.8 μm, the etching depth is not less than 21 μm, and the core space spacing is not less than 30 μm ; Figure 3-3 A lower cladding layer and lateral cladding layer 13 with a thickness of about 15 μm are formed by high-temperature thermal oxidation to limit light leakage; Figure 3-4 The core region 14 is grown by plasma enhanced chemical vapor deposition (PECVD) or flame hydrolysis (FHD) in the core space of the waveguide, the thickness of the core layer is controlled to 6 μm, and the refractive index is 0.75 according to the difference between the refractive index of the core region and the cladding layer. % to determine, the core material can be P 2 o 5 -GeO 2 -SiO 2 、GeO 2 -SiO 2 , SiON or P 2 o 5 -SiO 2 ; image 3 -5 is to use the FHD method or the PECVD method to grow the u...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com