The structure of a wear-resistant, drag-resistant and low-temperature resistant flexible cable comprises a cable core, wherein the cable core is formed by twisting three main wire cores, three ground wire cores and a cable core gap semiconductive filler, each main wire core comprises a cross-linking wire core formed by co-extruding a conductor, a semiconductive nylon strap, a conductor shielding layer, an insulation layer and an insulation shielding steam continuous vulcanization layer, each ground wire core comprises a conductor and a semiconductive material steam continuous vulcanization extruded on a surface of the conductor, an isolation strip, an inner sheath, a fiber weaving reinforcement piece and an outer sheath are sequentially applied outside the cable core to form a finished cable, the conductors adopt tin-plated annealed copper conductors, filaments of the tin-plated annealed copper conductors are more slim, and the diameter ranges of the filaments are 0.1-0.41 millimeter. A cable fabrication method comprises the steps of fabricating the main wire cores and the ground wire cores; fabricating the cable core; winding an isolation strip; extruding the inner sheath; weaving the reinforcement layer; and performing steam continuous vulcanization extruding or radiating the cross-linking outer sheath. The cable fabricated according to the method can conform to the design and application requirements, and meanwhile, the qualified rate reaches over 99%.