Three DOF micro-positioning workbench for nano-imprint lithography system

Abstract

The invention discloses a three DOF micro-positioning workbench for a nano-imprint lithography system, which comprises six piezoelectric ceramic drives; and each drive is connected with a base, and the top end is connected with a spherical connector by thread. The workbench also comprises six flexible fork chains of a flexible mechanism with totally consistent structure and a moving platform which is supported by the flexible fork chains; and three position sensors are used to measure the actual output of the moving platform, and are respectively fixed between a rigid support and the moving platform. The micro-positioning workbench is characterized by high resolution and high dynamic response speed, can serves as an auxiliary positioning platform of a nano-imprint lithography positioning system, and realize micro feeding and precise positioning.

Description

technical field [0001] The invention belongs to a micro-operating system, in particular to a two-translation and one-rotation flexible parallel micro-positioning workbench which can be applied to an imprint photolithography system. Background technique [0002] Nano-devices include nano-electronic devices and nano-optoelectronic devices, which can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices. , intelligence, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nano-devices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices is in a period of rapid development, and there are various methods, and patterning tec...

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process

The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

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