Chip washing equipment preventing blocking of pipe wall

Abstract

An equipment for washing chips features its additional cleaner for pipeline. Under the trigger of liquid drainage action, the gas supply into the gas pipeline is stopped, but a cleaning liquid that dissolves the particles in the gas pipeline is introduced into it to clean the inner surface of the pipeline. After cleaning is finished, the cleaning liuqid is cut off and gas is supplied into the gas pipeline again.

Description

technical field [0001] The invention relates to a chip cleaning device, in particular to a chip cleaning device with the function of preventing tube wall from being clogged. Background technique [0002] In today's semiconductor manufacturing process, chip cleaning equipment is a frequently used and indispensable device. Please refer to Fig. 1, which is a schematic structural diagram of commonly used chip cleaning equipment, wherein the liquid storage tank 11 is used to store cleaning solutions, such as buffer oxide layer etchant (Buffer HF, referred to as BHF or Buffer OxideEtcher, referred to as BOE ), and in order to enable the controller 12 of the chip cleaning equipment to effectively grasp the liquid level height of the cleaning solution in the liquid storage tank 11, a pressure-type liquid level sensor 13 (Pressure Leveling Sensor) is provided, which uses an inert gas (Usually nitrogen) passes through the pressure type liquid level sensor 13 and then uses a pipeline ...

AI Technical Summary

Problems solved by technology

Therefore, when the dry nitrogen gas is passed into the cleaning solution, especially an aqueous solution such as a high-concentration saturated buffer oxide layer etching solution (Buffer HF, referred to as BHF or Buffer OxideEtcher, referred to as BOE), a large amount of water absorption will occur, resulting in adhesion on The moisture in the solution on the pipe wall at the outlet of the pipeline 14 will precipitate out solute due to drying, which will cause particles to adhere to the pipe wall or even block the pipeline, making the pressure type liquid level sensor 13 unable to work normally to detect the correct liquid level. It is necessary to stop the machine to drain the liquid to clean the blockage of the pipeline, which not only causes waste of chemical liquid and time such as buffer oxide layer etchant, but also easily causes chemical damage to cleaning personnel. How to overcome the shortcomings of the above-mentioned prior art is The main goal of developing the present invention

Images