Plane switch mode active matrix liquid crystal display device and mfg. method thereof

An active matrix and planar switch technology, applied to static indicators, instruments, transistors, etc., can solve the problems of not being able to completely shield and reduce the impact of light

Inactive Publication Date: 2003-05-28
NEC LCD TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0023] However, the conventional liquid crystal display devices suggested by the above-mentioned published patents are accompanied by the inability to completely shield and reduce the effects of the reduction of light caused by the use of common electrodes containing light-impermeable materials.

Method used

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  • Plane switch mode active matrix liquid crystal display device and mfg. method thereof
  • Plane switch mode active matrix liquid crystal display device and mfg. method thereof
  • Plane switch mode active matrix liquid crystal display device and mfg. method thereof

Examples

Experimental program
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Effect test

no. 1 example

[0388] 28A to 28K are sectional views of the liquid crystal display device 10 showing steps of a first example of the method of manufacturing the liquid crystal display device 10 including the second interlayer insulating film 25 having a multilayer structure of inorganic films and organic films.

[0389] First, as shown in FIG. 28A, a chromium layer as the first metal layer is formed on a glass substrate as the electrically insulating transparent substrate 22, and then, the chromium layer is formed into the gate electrode 30c and the common electrode 30c by photolithography and dry etching. The pattern of the electrode lines 26a and 26b. Although only the common electrode line 26b is shown in FIGS. 28A to 30I, the common electrode line 26a will be described below together with the common electrode line 26b because the common electrode line 26a is formed together with the common electrode line 26b.

[0390] Then, as shown in FIG. 28B, a first interlayer insulating film 23 is f...

no. 2 example

[0400] 29A to 29I are cross-sectional views of the liquid crystal display device 10 showing steps of a second example of the method of manufacturing the liquid crystal display device 10 including the second interlayer insulating film 25 composed of a single organic film.

[0401] First, as shown in FIG. 29A, a chromium layer as a first metal layer is formed on a glass substrate as an electrically insulating transparent substrate 22, and then, the chromium layer is formed into a gate 30c and a common electrode by photolithography and dry etching. The pattern of lines 26a and 26b.

[0402] Then, as shown in FIG. 29B, the first interlayer insulating film 23 is formed over the entire transparent substrate 22, covering the gate electrode 30c and the common electrode lines 26a and 26b. The first interlayer insulating film 23 has a multilayer structure composed of a silicon dioxide (SiO2) film and a silicon nitride (SiNx) film.

[0403] Then, as shown in FIG. 29C , an amorphous sili...

no. 3 example

[0411] 30A to 30I are cross-sectional views of the liquid crystal display device 10, showing steps of a third example of the method of manufacturing the liquid crystal display device 10 including the second interlayer insulating film 25 composed of a single inorganic film.

[0412] First, as shown in FIG. 30A, a chromium layer as a first metal layer is formed on a glass substrate as an electrically insulating transparent substrate 22, and then, the chromium layer is formed into a gate 30c and a common electrode by photolithography and dry etching. The pattern of lines 26a and 26b.

[0413] Then, as shown in FIG. 30B, the first interlayer insulating film 23 is formed on the entire transparent substrate 22, covering the gate electrode 30c and the common electrode lines 26a and 26b. The first interlayer insulating film 23 has a multilayer structure composed of a silicon dioxide (SiO2) film and a silicon nitride (SiNx) film.

[0414] Then, as shown in FIG. 30C , an amorphous sili...

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Abstract

An in-plane switching mode active matrix type liquid crystal display device includes a first substrate, a second substrate located opposing the first substrate, and a liquid crystal layer sandwiched between the first and second substrates. The first substrate includes a thin film transistor, a pixel electrode each associated to a pixel to be driven, a common electrode to which a reference voltage is applied, data lines, a scanning line, and common electrode lines. Molecular axes of liquid crystal are rotated in a plane parallel with the first substrate by an electric field substantially parallel with a plane of the first substrate to thereby display certain images. The common electrode is composed of transparent material, and are formed on a layer located closer to the liquid crystal layer than the data lines. The common electrode entirely overlaps the data lines except an area where the data lines are located in the vicinity of the scanning line. The liquid crystal display device further includes a light-impermeable layer in an area where the common electrode entirely overlaps the data lines. The light-impermeable layer is comprised of a black matrix layer having a width smaller than a width of the common electrode.

Description

[0001] technical field of invention [0002] The invention relates to a liquid crystal display device and its manufacturing method, in particular to a planar switch mode active matrix liquid crystal display device and its manufacturing method. Background of the invention [0003] Liquid crystal display devices can be divided into two types, one of which is that the molecular axis of the oriented liquid crystal molecules rotates on a plane perpendicular to the substrate to display an image; the other type is that the molecular axes of the oriented liquid crystal molecules rotate in parallel Rotate on the plane of the substrate to display an image. [0004] A standard mode in the former type is a twisted nematic (TN) mode liquid crystal display device, and the latter type is called an in-plane switching (IPS) mode liquid crystal display device. [0005] Because the viewer only watches from the direction extending along the short axis of the liquid crystal molecules, even if he / ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/133G02F1/1337G02F1/1343G02F1/136H01L29/786
Inventor 西田真一松本公一半贯贵久板仓州优
Owner NEC LCD TECH CORP
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