Substrates with self-cleaning surface, process for their prodn. and their use

A self-cleaning, substrate technology, used in the field of substrates with self-cleaning surfaces, compositions of substrates, glazed or enamel substrates

Inactive Publication Date: 2004-03-10
FERRO CORP
View PDF4 Cites 28 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the above method, the structure-forming particles are not f

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0056] Preparation of float glass or high-grade steel with transparent self-cleaning surfaces

[0057] 1. 4mm float glass was coated by screen printing with the composition of the invention. The composition contains account screen printing media (No. 80858 from dmc 2 Co., Ltd.) 0.5% by weight of boric acid (B 2 o 3 ) and 4% by weight of fumed silica. The average particle diameter of the fumed silica primary particles was 12 nm. The printing medium is a medium compatible with water. A 100T screen is used for screen printing. After drying, the coating was flash heated at 660°C for 4 minutes. The dried structured surface is hydrophobized by using a fluoroalkylsilane composition, which is an ethanol solution of tridecafluorooctyltriethoxysilane. The solution is applied to the substrate and allowed to cure at elevated temperature.

[0058] Float glass coated in this way is transparent and has a contact angle greater than 150°.

[0059] 2. Repeat Example 1, the difference i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Substrates, in particular a substrate of glass, ceramic, plastic and metal and glazed or enamelled substrates, with a self-cleaning surface comprise an at least partly superficially hydrophobic structured (elevations and depressions) coating located on the substrate. Substrates according to the invention comprise particles with an average diameter of less than 100 nm, in particular 5 to less than 50 nm, for formation of the structure of the coating. Compositions according to the invention which are employed for the production of the structured coating of substrates according to the invention comprise, in addition to the structure-forming particles, a layer-forming material in a weight ratio of 100:1 to 1:2, in particular 20:1 to 1:1. In addition to having good self-cleaning properties, the coating is distinguished by its transparency. The use of the substrates is aimed in particular at the most diverse glass articles.

Description

technical field [0001] The invention relates to substrates having at least one self-cleaning surface, in particular glass, ceramic, plastic or metal substrates, or glazed or enamelled substrates. The self-cleaning surface on the substrate is based on a coating having structured particles located on the substrate so as to form an uneven surface structure; at least part of the surface is hydrophobic. The invention also relates to compositions for preparing said substrates having at least one self-cleaning surface. The invention also relates to a method for the preparation of said substrate having at least one self-cleaning surface, said method comprising the step of coating said substrate with said composition. Finally, the present invention also relates to the use of substrates according to the invention having self-cleaning surfaces. Background technique [0002] It is known that in order to obtain good self-cleaning properties of the surface, it is necessary to make the s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C03C17/38B08B17/06C03C8/14C03C8/20C03C17/00C03C17/34C03C17/42C04B41/52C04B41/89C23C24/08C23C24/10C23C26/00C23C28/00C23C28/04
CPCY10T428/259Y10T428/24355B08B17/065Y10T428/31663C03C17/007Y10T428/256C03C2205/04Y10T428/31504C04B41/009C03C2217/77Y10T428/25C04B2111/2069C23C24/08Y10T428/24364C03C17/42C03C8/14Y10T428/2438C03C2217/452C04B41/89C03C2217/475C03C2217/76C23C24/10Y10T428/31612C03C8/20C04B41/52B08B17/06Y10T428/24372C03C17/34Y10T428/258Y10T428/2982Y10T428/31667C04B41/0072C04B41/4539C04B41/5006C04B41/5035C04B41/5015C04B41/522C04B41/4933C04B33/00
Inventor 马丁·鲍曼克劳斯·迪特尔·弗利切达格玛·克尔贝拉兹斯蒂芬·路德维格路德维格·波特
Owner FERRO CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap