Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Grinding device for shadow mask support

A cover frame and grinding technology, applied in the field of grinding devices, can solve the problems of low work efficiency, low productivity, increased processing time, etc., and achieve the effect of reducing equipment cost

Inactive Publication Date: 2004-07-28
PANASONIC CORP
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to such a reaction change, it is difficult to achieve high precision in the degree of cylindricity and curvature of the shadow mask surface.
Moreover, in order to prevent the occurrence of reaction changes, although the frame is precisely positioned by using a three-point support method, it still requires extremely skillful fixing methods, so the productivity is low
[0006] Moreover, in cutting or grinding, if the fixing strength to the frame processing device is reduced in order to prevent the above-mentioned reaction, the processing time will increase due to the necessity of light-load processing.
[0007] In addition, loading and unloading between the frame and the processing device is time-consuming and laborious, and the work efficiency is very low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Grinding device for shadow mask support
  • Grinding device for shadow mask support
  • Grinding device for shadow mask support

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] Below, see Figure 1-Figure 6 Embodiments of the present invention will be described.

[0026] figure 1 is an oblique sketch showing the structure of the mask frame. while in figure 2 The shadow mask frame structure is also shown, figure 2 (A) is a bottom view, figure 2 (B) is the left side view, figure 2 (C) is a front view.

[0027] As shown in the figure, the shadow mask frame (frame, hereinafter referred to as the frame) 10 is composed of a pair of short side frames 11a, 11b arranged in parallel and a pair of long side frames 12a, 12b arranged in parallel, and the short side frames 11a, 11b and The long side frames 12a, 12b are welded together at the ends. The short side frames 11a and 11b are formed by bending a metal flat plate into a substantially U-shaped cross section. On the other hand, the long side frames 12a, 12b are formed by bending a flat metal plate so that the end faces are substantially triangular. The metal plates forming the long side f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

After assembling a framework 10 in an approximately rectangular form, a basis plane 17 is formed by grinding a bottom surface of the framework. Then, ends of two opposing sides 12a and 12b of the framework on a side opposite to the basis plane are cut in a predetermined shape by shearing. The grinding can be carried out by placing the framework on a grinding surface that is running, while applying substantially no pressurizing force other than the self weight of the framework. According to this method, precision of forming end faces of a framework on which a shadow mask is mounted can be improved. Also, working time can be shortened.

Description

technical field [0001] The present invention relates to a grinding device for a shadow mask frame of a cathode ray tube. In particular, the present invention relates to a device for processing the mounting end surface of a shadow mask, which can be manufactured with extremely high precision when, for example, the ends of the double-sided brackets facing the frame are processed into a curved shape to erect the shadow mask. Cylindricity and curvature of the cylindrical surface formed by the shadow mask surface. Background technique [0002] The shadow mask is generally erected on a frame assembled into a rectangle by means of welding, etc., and installed in the cathode ray tube. The frame is generally configured such that a pair of long side frames are horizontally secured to upper and lower ends of a pair of spaced apart vertically arranged short side frames. Therefore, the shadow mask is mounted on the screen side ends of the pair of long side frames. [0003] The shadow ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B21D17/00H01J9/14
CPCH01J9/142H01J2229/0722B21D17/00
Inventor 佐藤宪一竹内太造奥村耕之助
Owner PANASONIC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com