Dielectric multilayer filter and its manufacturing method, and solid-state imaging device
A technology of multi-layer medium and optical filter, applied in optical filter, electric solid device, chemical instrument and method, etc., can solve the problem of uneven color of picture
Inactive Publication Date: 2005-08-24
SEIKO EPSON CORP
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As the angle of incidence increases as it moves toward the end of the solid-state imaging device 130, in an image converted from an optical image into an electrical signal by the solid-state imaging device 130, colors appear as it moves from the center to the periphery. Tendency to become stronger, making the color of the picture uneven
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[0077] Regarding the light incident on the point of 2.5mm from the center of the solid-state imaging device whose distance is 1 / 3.6inch (diagonal 5mm), the design data of the comparative example of the multilayer dielectric film filter with approximately the same viewing angle are shown in Table 1 As shown, the design data of the embodiment is shown in Table 2. in addition, Figure 5 (a) shows a cross-sectional view of a lens of a comparative example, Figure 5 (b) shows a sectional view of a lens of an example. In the lens sectional view, Ri (i represents an integer starting from 1) sequentially represents the lens surface number from the incident side to the solid-state imaging device side, and di (i represents an integer starting from 1) sequentially represents the lens surface number from the incident side to the solid-state imaging device. The central thickness of the lens on the main optical axis of the side and the air space between the lenses (mm). Table 1 and Table...
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The invention relates to providing a dielectric multilayer filter capable of minimizing the incident angle of light with respect to its dielectric multilayer film capable which reflects light of a given wavelength such as infrared light and making the angular dependence of the dielectric multilayer film as small as possible. A dielectric multilayer filter 1 including: a light-transmissive substrate 2 having a flat surface at least one side thereof; a dielectric multilayer film 3 formed on the flat surface of the light-transmissive substrate 2, the dielectric multilayer film reflecting light of a particular wavelength; and a resin focusing lens 4 glued on the at least one side of the light-transmissive substrate 2. The dielectric multilayer filter 1 is used as a dust-tight cover of the solid-state imaging element's device 100.
Description
technical field [0001] The present invention relates to a multilayer dielectric film filter used as an infrared-removing filter in a digital camera or the like, a method for manufacturing the filter, and a solid-state imaging device using the filter. Background technique [0002] A CCD (Charge Coupled Device: Charge Coupled Device) is widely used as a solid-state imaging device such as a video camera or a digital still camera. CCD has sensitivity to light in a wide wavelength range, not only in the visible light region, but also in the infrared light region (750nm ~ 2500nm) to light sensitivity. However, in general camera applications, the infrared region invisible to the human eye is unnecessary, and if near-infrared rays enter the solid-state imaging device, problems such as resolution degradation and image unevenness will occur. Therefore, an infrared cut filter such as colored glass is inserted into an optical system such as a camera to remove near-infrared rays from in...
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IPC IPC(8): G02B3/00G02B5/26G02B5/28G02B5/30G02B13/00G02B13/18G02B27/46G03B11/00H01L27/14H01L27/146H01L31/0216H01L31/0232H04N25/00
CPCH01L27/14625H01L27/14618H04N5/2254H01L31/02165G02B13/002G02B5/282G02B27/46H01L31/0232H01L2924/0002H01L31/02325H04N23/55H01L2924/00G02B5/22G02B1/041
Inventor 向山浩行小松朗平山正己
Owner SEIKO EPSON CORP