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Anticipatory high frequency noise compensation in a distributed process control system

A control system and process control network technology, applied in the field of distributed process control network, can solve the problems of high price, short round-trip communication time, and unnecessary

Inactive Publication Date: 2006-03-08
ROSEMOUNT ANALYTICAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using a faster comms ring is usually expensive and generally not necessary
However, control systems using slow scan periods cannot compensate for high frequency process variables, which typically have a duration that is shorter than the round-trip communication time between the measuring device and the controller generating the compensating control signal

Method used

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  • Anticipatory high frequency noise compensation in a distributed process control system
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  • Anticipatory high frequency noise compensation in a distributed process control system

Examples

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Embodiment Construction

[0014] figure 2 A distributed control network 20 (DCN) is illustrated comprising two user interfaces (UI) 22 communicatively connected to a physical communication network 24, which may be Ethernet or any other desired communication network. DCN 20 further includes subnetwork 26 and subnetwork 28, either or both of which may use  、PROFIBUS  and the underlying FIELDBUS  protocol, such as any proprietary or open source communication protocol. figure 2 The sub-network 26 illustrated in includes a controller 30 , which may be a personal computer, programmable logic controller, stand-alone processor, or other device suitable for storing and executing process control programs and communicating with the UI 22 . Controller 30 is communicatively coupled to a pair of input / output (I / O) devices 34a and 34b through a local physical network 32, which may be a proprietary or open source backplane. The I / O device 34a is, for example, communication on a bus or ring structure related to ...

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Abstract

A control system includes a measurement device capable of gathering high frequency process parameter data, a modeling routine which uses the high frequency parameter data to develop a model of the high frequency noise and a compensation routine that employs the developed model to adjust a control signal to thereby compensate for the high frequency noise present within the process parameter. The measurement device may measure a process variable at a relatively high frequency and send a subset of the measured data (eg., the low frequency data) to a standard controller that generates a control signal to control the measured process parameter in any known manner. The modeling routine analyzes the high frequency data and develops a methematical model of the high frequency noise within the process variable. The resulting mathematical model may then be used by the compensation routine to alter the standard control signal produced by the controller before that control signal is delivered to or used by the device being controlled.

Description

technical field [0001] The present invention relates generally to distributed process control networks, and more specifically to reducing high frequency noise in distributed process control networks. Background technique [0002] Large continuous manufacturing processes, such as chemical, paper and petroleum manufacturing processes, utilize a large number of strategically located field devices to monitor and control critical process parameters in the manufacturing process. These critical process parameters may be measured or monitored using, for example, flow meters, speed sensors, pressure transducers, and thermocouples, or may be manipulated or controlled using devices such as valve positioners, servo motors, heating elements, and the like. [0003] In the past, manufacturing processes have relied on manual control systems, such as operators reading pressure gauges and adjusting associated pressure valves, to monitor and control critical process parameters. Manufacturing ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B21/02G05B17/02
CPCG05B17/02G05B21/02
Inventor 马里恩・A・凯斯
Owner ROSEMOUNT ANALYTICAL
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