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Method of forming metal blanks for sputtering targets

A technology for metal blanks and sputtering targets, applied in the field of reducing the manufacturing cost of sputtering targets and/or metal disks, preparing sputtering targets, and preparing improved metal disks, which can solve the problems of expensive, difficult separation, and contamination of tantalum

Inactive Publication Date: 2006-05-10
CABOT CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, achieving such tight tolerances in gauge and flatness requires grinding and finish grinding of the blank, a process that is prohibitively expensive and produces an excess of low-value grinding waste known as swarf
In general, the value of tantalum contained in swarf is lower than that of tantalum swarf produced by machining operations because it is often difficult and expensive to separate tantalum particles from grinding media containing swarf, and compared to machining, by Grinding has a greater tendency to contaminate tantalum

Method used

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  • Method of forming metal blanks for sputtering targets
  • Method of forming metal blanks for sputtering targets
  • Method of forming metal blanks for sputtering targets

Examples

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Embodiment 1

[0060] figure 1 Shown is a rolled metal having as-rolled or as-level-rolled flatness denoted by "f" and initial gauge thickness denoted by "g" board (10). A planar radiation subtractive target (20) of final thickness "t" can be produced. In general, the relationship between initial thickness and final thickness with respect to initial flatness is:

[0061] g=t+(2f+0.005″)

[0062] The amount of scrap generated in the production of target 20 from plate 10 can be calculated using the following formula:

[0063] Vs=(2f+0.005″)·A T ·ρ Ta A T = target area ρ Ta =0.60lbs / in 3

[0064] And the scrap account can be calculated using the following formula:

[0065] C s =V s (M s ) M s = marked value of scrap (marked value) V s = waste volume C s = waste account

[0066] Consider diameter (154in 2 ) and 0.250″ thick tantalum blank 14″ production costs, and standard plate production costs (C st )$250 / lb.

[0067] Case 1 Twin disc ground to 0.005" flatness as hori...

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Abstract

The present invention relates to improvements in the manufacture of metal blanks, disks and sputtering targets by smoothing only one of the two surfaces of the metal sheet. The elimination of the second surface of the smoothed metal sheet results in a significant cost reduction. The metal sheet of the present invention preferably has a single side flatness of 0.005 inches or less, which improves the reliability of the bond between the target blank and the backing sheet. Preferred metals include, but are not limited to, tantalum, niobium, titanium, and alloys thereof. The invention also relates to machining a first side of a metal sheet, bonding the first side to a backing sheet, and then optionally machining a second side of metal.

Description

technical field [0001] The present invention relates to a method of manufacturing a sputtering target which reduces processing costs and improves quality and reliability relative to conventional methods of making sputtering targets. The invention further relates to methods of making improved metal disks. The invention also relates to a method of reducing the manufacturing costs of sputtering targets and / or metal discs. Background technique [0002] In the field of metal production in general, especially in the field of sputtering targets, important difficulties arise in connection with the costs of producing flat disks with particularly high specific dimensional requirements. It is common practice in the art of making metal discs to smooth both sides of the metal blank that ultimately forms the metal disc, such as a tantalum sputtering target preform. This requires grinding both sides of the metal blank, rolling both sides, or flattening and / or resurfacing the metal sides....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22F1/00C23C14/34
CPCC22F1/00C23C14/3407B24B1/00C23C14/3414
Inventor 克里斯托弗·A·米哈卢克
Owner CABOT CORP
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