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Step forward heat treatment device

A heat treatment device, step-by-step technology, used in lighting and heating equipment, furnace types, furnaces, etc., can solve the problems of solar cell characteristics changes, uneven characteristics, substrate changes, etc., to shorten the rise time or heat treatment time. , The beam drive mechanism is simple, lightweight and rigid

Inactive Publication Date: 2006-08-09
NORITAKE CO LTD
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Problems solved by technology

[0007] However, in the conventional heat treatment apparatus, even if radiation heating is performed for rapid heat treatment, the beam is unavoidably located between the lower surface of the substrate and the heating plate. , so it is difficult to achieve uniform rapid heating, there must be some degree of rise time, such as 20 to 30 seconds or so
Therefore, the characteristics of the substrate are changed due to the influence of heat, and the characteristics are uneven, or the quality is damaged, and the yield rate is lowered.
For example, when heat treatment for forming comb-shaped electrodes is performed on the front and back of the solar cell substrate, there is a problem that the characteristics of the solar cell suffer from changes

Method used

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Embodiment Construction

[0055] Here, preferably, among the transparent ceramics constituting at least a part of the first beam and / or the second beam, the term "transparent" means that it can help the radiant energy from the heating body to pass through the transparent ceramics. Reaching the lower surface of the substrate, the transmittance of the degree of uniform heating and rapid heating of the substrate is realized. For example, when using a heater that emits near-infrared rays, it means transparency that can be transmitted to the extent that the near-infrared rays can help the near-infrared rays reach the bottom of the substrate to achieve uniform heating or rapid heating of the substrate. In visible light of other wavelengths heated, there is no problem even if it becomes cloudy (opaque). Determined based on the wavelength of radiation from a heating body for radiative heating of the substrate.

[0056] In addition, it is preferable that the heater used for radiatively heating the substrate is...

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Abstract

To provide a walking beam type heat treatment device capable of shortening the rising time in heating as much as practicable or shortening the time for the heating process. The walking beam type heat treatment device 10 includes a stationary beam 20 and a movable beam 22 formed from a transparent quartz tube, and the radiation energy from a halogen heater (heating body) 78 can reach the reverse surface of a base board through the transparent quartz tubes, so that it is easy to make quick heating uniformly, compared with a conventional arrangement, which allows shortening the rising time or the time for heating process. As a result, the risk of the heat treatment affecting the characteristics of the base board is lessened as much as practicable.

Description

technical field [0001] The present invention relates to a step-by-step heat treatment device for heat treating substrates such as semiconductor substrates. Background technique [0002] There is known a heat treatment apparatus provided with a walking-type substrate conveying device for conveying the substrate using a walking beam in a heat-treating furnace for heat-treating a substrate such as a semiconductor substrate. In such a heat treatment apparatus, the substrate is transported in a heat treatment furnace for drying or firing, and a heat treatment such as a treatment for fixing and forming a film material on the surface (upper surface) and / or the back surface (lower surface) of the substrate is performed. . For example, what is described in Patent Document 1 or Patent Document 2 is this device. [0003] Patent Document 1: JP-A-2003-176011 [0004] Patent Document 2: JP-A-2004-18122 [0005] In the heat treatment apparatus provided with the above-mentioned stepping...

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Application Information

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IPC IPC(8): F27B9/24
Inventor 高羽义明岩田崇
Owner NORITAKE CO LTD
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