Substrate positioning device, substrate positioning method and program
The technology of a positioning device and a positioning method is applied in the directions of optics, instruments, and photoplate-making process of pattern surface, etc., and can solve the problems such as inability to detect the peripheral part of the wafer.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0100] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. However, in this specification and the drawings, the same reference numerals are assigned to components having substantially the same functional configuration, and repeated explanations are omitted.
[0101] (Example of configuration of substrate processing equipment)
[0102] First, a configuration example of a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. Here, a substrate processing apparatus in which at least one vacuum processing unit is connected to a transfer chamber will be described as an example. figure 1 A cross-sectional view showing a schematic configuration of a substrate processing apparatus according to this embodiment. This substrate processing apparatus 100 has one or two or more vacuum processing units 110 for performing various processes such as...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com