Polishing liquid for grinding and polishing micro crystal glass

A glass-ceramic and polishing liquid technology, applied in polishing compositions containing abrasives, water-based dispersants, etc., can solve problems such as sagging, and achieve the effects of stable state, guaranteed flatness, and easy removal

Inactive Publication Date: 2006-11-08
HEBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to overcome the technical problems of surface scratches, edge sag and cleaning in the existing CMP (Chemical Mechanical Polishing) polishing solution for glass-ceramics,

Method used

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Examples

Experimental program
Comparison scheme
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Example Embodiment

[0029] Take Example 1 to briefly describe the preparation process of the present invention:

[0030] Take 2L of 35-40nm silica sol solution, 2L of deionized water, 100mL of tetrahydroxyethylethylenediamine, 20mL of FA / OI active agent, and 9mL of 25% KOH solution. Mix 2L of silica sol solution with 2L of deionized water and stir to dilute, add 100 mL of organic base hydroxyethyl ethylenediamine and 9 mL of 25% KOH solution while stirring, and finally add 20 mL of FA / OI active agent with stirring.

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PUM

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Abstract

The present invention discloses polishing liquid for grinding and polishing microcrystal glass. The polishing liquid consists of silica sol 30-90 vol%, organic amine alkali 1-10 vol%, activator 0.5-5 vol%, KOH solution 0.5-5 vol%, and deionized water for the rest. Under CMP and high pH condition, silica as the main component of microcrystal glass is converted fast into stable silicate. The present invention has composite alkali to form high pH value, homogeneous and easy-to-clean silica sol as abrasive, organic alkali and activator to make the silica sol kernel form stable film without dissolving at pH value over 12.5. The present invention has no scoring, high polishing rate, high flowability, no precipitate and easy cleaning.

Description

technical field [0001] The invention relates to the technical field of chemical mechanical polishing, and more specifically relates to a polishing liquid for optical wafer grinding and polishing. Background technique [0002] Glass-ceramic is a kind of basic material used in the fields of electronics, microelectronics and optoelectronics. It is mainly used in the second generation of computer hard disks and components with functions such as optoelectronics, thermoelectrics, acousto-optics, and magneto-optics. It is used in the production of aircraft control and inertial navigation. , Guidance and control of the basic material of optical components. Research on glass-ceramic is a key project of national defense. Due to the particularity of its application field, the surface roughness of glass-ceramic is required to be less than 0.1 nanometer, and there are strict requirements on surface shape, defects and cleanliness. At present, asphalt polishing is used for military and hi...

Claims

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Application Information

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IPC IPC(8): C09G1/02C09G1/04
Inventor 刘玉岭武晓玲
Owner HEBEI UNIV OF TECH
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