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Vacuum evaporation apparatus and method of producing electro-optical device

A vacuum and evaporation technology, applied in vacuum evaporation coating, optics, sputtering coating, etc., can solve the problems of change, difficulty in practice, and difficulty in fully improving the productivity and maintainability of left and right evaporation devices, so as to improve the film quality and productivity improvement

Inactive Publication Date: 2007-01-10
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, even if it is assumed that the device can be miniaturized by controlling the vapor deposition material so as to advance obliquely with respect to the substrate by using a collimator or the like as in the prior art, it is difficult to change the macroscopic size of the vapor deposition device, and it is difficult to sufficiently Greatly improve the productivity and maintainability of left and right vapor deposition equipment
That is, in the conventional technology, there is a technical problem that it is difficult to sufficiently improve the productivity of the vapor deposition apparatus.
[0007] In particular, when an inorganic alignment film having a predetermined pretilt angle is formed on a substrate such as an element substrate or a counter substrate constituting an electro-optical device such as a liquid crystal device by oblique vapor deposition, if the film is formed using conventional techniques, a vacuum chamber can be realized. It is practically extremely difficult to miniaturize the whole and form a uniform inorganic alignment film over the entire substrate surface

Method used

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  • Vacuum evaporation apparatus and method of producing electro-optical device
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  • Vacuum evaporation apparatus and method of producing electro-optical device

Examples

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Embodiment 1

[0089]

[0090] First, refer to figure 1 The structure of the vacuum vapor deposition apparatus 10 of Example 1 of the present invention will be described. it's here, figure 1 is a schematic perspective view of the vacuum evaporation apparatus 10 .

[0091] exist figure 1 Among them, the vacuum evaporation apparatus 10 includes a target chamber 100 , a processing chamber 200 and a flight chamber 300 .

[0092] The target chamber 100 is a vacuum chamber at least partially made of a metal material such as aluminum or stainless steel or a steel material, and is an example of the "first vacuum chamber" of the present invention.

[0093]The inner wall portion of the target chamber 100 defines a space 101 as an example of the "first space" of the present invention inside the target chamber 100, and a target 110 and an electron beam irradiation system 120 are installed in the space 101. A part of the bottom surface of the target chamber 100 is connected to a first exhaust syste...

Embodiment 2

[0137] The form of covering the communicating port 202 is not limited to the shielding plate 220 of the first embodiment. refer to Figure 6 Explain this. it's here, Figure 6 is a schematic perspective view of a shielding body 1000 according to Embodiment 2 of the present invention. Also, in this figure, for those with image 3 Duplicated parts are assigned the same reference numerals and their descriptions are omitted.

[0138] exist Figure 6 Among them, the shielding body 1000 is a block-shaped object covering the communication port 202, and is another example of the restricting device of the present invention having a part of the slit portion 1100 penetrating the shielding body 1000.

[0139] The slit portion 1100 has a rectangular lower opening surface 1100 a on the surface portion of the shielding body 1000 facing the communication port 202 , and has the same shape as the lower opening surface 1100 a on the surface portion of the shielding body 1000 facing the subs...

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Abstract

Provided a vacuum evaporation apparatus that can improve productivity and a method of producing an electro-optical device using the same. The vacuum evaporation apparatus 10 includes a target chamber 100, a process chamber 200, an a flight chamber 300. The respective chambers are composed so as to retain a vacuum independently, and an evaporation substance 110a generated from a target 110 is vapor-deposited on a substrate 210 held within the process chamber 200 rotatably by a fixture 900.

Description

technical field [0001] The present invention relates to the technical field of a vacuum evaporation device suitable for oblique deposition of an inorganic alignment film of an electro-optical device such as a liquid crystal device and a method of manufacturing an electro-optical device using the vacuum evaporation device. Background technique [0002] In this technical field, a technique using a collimator has been proposed (for example, refer to Patent Document 1). According to the film-forming apparatus disclosed in Patent Document 1 (hereinafter referred to as “conventional technology”), by placing the target between the target and the substrate to be film-formed in a vacuum chamber or a vacuum chamber, the A collimator that controls particles advancing toward the substrate to advance obliquely with respect to the film-forming surface of the substrate realizes miniaturization of the device, improvement of maintainability, and the like. [0003] In addition, in this techn...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/24C23C14/225C23C14/044C23C14/246G02F1/13G02F1/1337
Inventor 清水雄一
Owner SEIKO EPSON CORP