Ti-Ni-based shape-memory alloy and method of manufacturing same
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[0028] Using a Ti--Ni target material, thin films of an amorphous Ti--Ni alloy containing 48.2 atomic % Ni were formed on a glass substrate by argon ion sputtering. The thickness of the films was about 7 .mu.m and its composition was determined by electron probe X-ray microanalysis.
[0029] A thin film heat-treated at 745 K for 1 hr was observed by means of a high-resolution electron microscope. FIG. 1 illustrates an example of electronmicrograph thereof. FIG. 2 is an enlarged micrograph thereof. As is known from the micrographs of FIGS. 1 and 2, a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the {100}bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm. The precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale. The precipitate was confirmed to be Ti-rich by EDS analysis...
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