Method for polishing workpiece, polishing apparatus and method for manufacturing semiconductor device
a technology for polishing workpieces and semiconductor devices, applied in the direction of manufacturing tools, grinding machines, lapping machines, etc., can solve problems such as providing uneven surface conditions of wafers, and achieve the effects of improving polishing rate, high polishing accuracy, and high reliability
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first embodiment
[0089]FIG. 1A and FIG. 1B present schematic diagrams, showing a configuration of a polishing apparatus according to the present embodiment. FIG. 1A is a cross-sectional view of the polishing apparatus. FIG. 1B is a plan view, showing a polishing pad 2, a slurry feeder 7, a carrier 4 and a wafer 3 sustained on the polishing apparatus shown in FIG. 1A. The polishing apparatus shown in FIGS. 1A and 1B will be described. Basic configuration of this polishing apparatus is substantially the same as the conventional apparatus. More specifically, the polishing pad (abrasive cloth) 2 is put on a rotatable table 1, and the carrier 4 for maintaining the wafer (workpiece) 3 is provided so as to face against the polishing pad 2. Further, the slurry feeder 7, which is capable of dropping an abrasive material (slurry) 8 (see FIG. 11) is provided above the polishing pad 2. An illustrative example thereof may be that the table 1 is a circular member having a diameter of about 500 mm, and is capable ...
second embodiment
[0106] A second embodiment according to the present invention will be described as follows in reference to FIG. 4. Here, an identical numeral is assigned to a same element appeared in the first embodiment, and the detailed description thereof is not presented.
[0107] In the first embodiment, the region B being free of groove 2a provided in the central portion of the polishing pad 2, and the slurry dropping position is located outside of the region B of the polishing pad 2 being free of the groove 2a. However, in the present embodiment, slurry dropping position is not particularly limited. Since the slurry 8 generally moves from the inner side of the polishing pad 2 toward the outer portion by the centrifugal force and cannot move toward the inner direction, the slurry feeder 7 extends to the interior of the region B being free of groove 2a as shown in FIG. 4, and even if the configuration, in which the slurry 8 is dropped in the region B, is employed, the slurry 8 cannot remain in t...
third embodiment
[0108] A third embodiment according to the present invention will be described as follows in reference to FIG. 5. Here, an identical numeral is assigned to a same element appeared in the first and the second embodiments, and the detailed description thereof is not presented.
[0109] In the first embodiment, the region B being free of groove 2a is provided in the central portion of the polishing pad 2. On the other hand, grooves 2a are formed over the entire surface of the polishing pad in the present embodiment. However, the slurry dropping position is disposed at a position outer from the central portion by a predetermined distance similarly as in the first embodiment, or in other words, at a position outer than the region that is desirable to have reduced polishing rate. Even if the grooves 2a exist in the central portion of the wafer 3, the slurry 8 moves from the inner side of the polishing pad 2 to the outer side thereof by a centrifugal force, and cannot move toward the inner s...
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Abstract
Description
Claims
Application Information
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