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Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement

a technology of carbon dioxide and semiconductor tools, applied in the direction of container discharge methods, vessel construction details, cleaning using liquids, etc., can solve the problems of not providing a means of controlling the release of pressure in the buffer vessel, and the selection of temperature in the buffer volume is not recognized in the related art, so as to eliminate the time lag

Inactive Publication Date: 2005-12-08
PRAXAIR TECH INC
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0013] It is a further object to deliver the required carbon dioxide flow rate, instantaneously, and therefore eliminate the time lag that would be required when utilizing pumps to provide the required flow rate.

Problems solved by technology

One of the disadvantages associated with the related art systems is that they do not recognize the selection of temperature in the buffer volume as an important factor in controlling the amount of carbon dioxide available for delivery to a semiconductor application tool.
Another disadvantage is that the related art does not provide a means of controlling the release of the pressure in the buffer vessel.

Method used

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  • Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement
  • Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement
  • Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement

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Embodiment Construction

[0027] The manufacturing of integrated circuit devices requires numerous complicated steps necessary to form various features onto the wafer substrate. Some of the steps include cleaning the substrate with high-pressure carbon dioxide. As utilized herein the term “high-pressure carbon dioxide” refers to carbon dioxide at a pressure greater than its critical pressure of 1060 psig. In the event that the temperature associated with the carbon dioxide is below its critical temperature of 88° F. and is at high pressure it will be understood that the fluid is in liquid phase. On the other hand, if the temperature associated with the carbon dioxide is greater than 88° F., the fluid will be in supercritical phase. Therefore, at above 1060 psig, the carbon dioxide is in one phase only, whether it be liquid or supercritical (i.e. no discontinuous phase transition).

[0028] The semiconductor cleaning process of the present invention provide an effective means of supplying high-pressure carbon d...

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Abstract

Provided is a novel method and system for supplying high-pressure carbon dioxide to an application having a variable carbon dioxide flow requirement. The method includes providing a high-pressure carbon dioxide feed stream to a buffer volume and determining the amount of carbon dioxide to be delivered to the application tool. The pressure in the buffer volume is maintained at a pressure that exceeds the pressure required by the application tool. The temperature in the buffer volume is further adjusted to modify the density of the carbon dioxide and based thereon the size of the buffer volume. Thereafter, the carbon dioxide from the buffer volume is delivered at a variable flow rate as required by the application tool.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to a method for supplying high-pressure carbon dioxide to an application having a variable carbon dioxide flow requirement. In particular, the invention relates to supplying carbon dioxide to a semiconductor application tool that has an instantaneous demand, which is significantly higher than its average demand. [0003] 2. Description of Related Art [0004] The need for the instantaneous delivery of a fluid has long been known. In related applications, high pressure gas sources have been utilized where an instantaneous demand for fluid is necessary. For example, U.S. Pat. No. 4,977,921 to Knight et al. discusses the use of a modified tube trailer to store high pressure air or nitrogen in order to provide a high instantaneous flow of gas to clean out large size lines. U.S. Pat. No. 5,417,615 to Beard concerns the use of a pressurized gas source to store high-pressure air that is used to pr...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B08B7/00C01B32/50C23G1/00F17C9/02H01L21/02
CPCB08B7/0021F17C2270/0518H01L21/02101F17C2205/0323F17C2205/0338F17C2205/0341F17C2221/013F17C2223/0153F17C2223/0169F17C2223/035F17C2223/046F17C2225/0123F17C2225/036F17C2227/0135F17C2227/0306F17C2227/0337F17C2250/0626F17C2250/0631F17C2265/012F17C9/02B08B3/10B08B5/02
Inventor JOHNSON, MICHAEL CLINTONTIMM, MARTIN L.BILLINGHAM, JOHN FREDRIC
Owner PRAXAIR TECH INC
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