CoPtP thin film having very high perpendicular magnetic anisotropy and method for manufacturing the same
a technology of perpendicular magnetic anisotropy and thin film, which is applied in the direction of magnetic materials, magnetic bodies, electrical equipment, etc., can solve the problems of difficult control of each component in the alloy, difficult to obtain a thin film with stable quality, and difficult to use vacuum deposition methods for mems elements, micro elements, nano elements, etc., to achieve good coercivity and squareness
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experimental example 1
[0043] An electroplating solution including CoSO4·7H2O at 0.13 M, H2PtCl6 at 0.005 M, NaH2PO2 at 0.05 M, an ammonium salt at 0.15 M, and Na4P2O7 at 0.45 M was prepared. The pH of the electroplating solution was 8.4 and the temperature thereof was maintained at 40° C. As an anode, a cobalt plate was dipped in the electroplating solution and a current density was maintained at 10 mA / cm2. Therefore, a CoPtP alloy thin film was formed by using an electroplating method.
[0044]FIG. 2 shows a magnetic hysteresis curve of the CoPtP alloy thin film that was manufactured according to Experimental Example 1 of the present invention. It is possible to obtain values of saturated magnetization (Ms), residual magnetization (Mr), coercivity (Hc), squareness (Mr / Ms), etc., from FIG. 2. The X-axis denotes a magnetic field strength and the Y-axis denotes a magnetization amount according to the magnetic field strength in the magnetic hysteresis curve. In particular, the Y-axis is shown to be standardiz...
experimental example
[0046] An electroplating solution including CoSO4·7H2O at 0.13 M, H2PtCl6 at 0.01 M, NaH2PO2 at 0.02 M, an ammonium salt at 0.25 M, and Na4P2O7 at 0.5 M was prepared. The pH of the electroplating solution was 8.4 and the temperature thereof was maintained at 30° C. As an anode, a cobalt plate was dipped in the electroplating solution and a current density was maintained at 5 mA / cm2. Therefore, a CoPtP alloy thin film was formed by using an electroplating solution.
[0047]FIG. 3 shows a magnetic hysteresis curve of the CoPtP alloy thin film which was manufactured according to Experimental Example 2 of the present invention. The coercivity of the CoPtP alloy thin film was 4410 Oe and the squareness thereof was 0.96. Since the squareness of the CoPtP alloy thin film is very high, it shows the best property among CoPtP alloy thin films which have been manufactured by using an electroplating method thus far.
experimental example 3
[0048] An electroplating solution including CoSO4·7H2O at 0.10 M, H2PtCl6 at 0.015 M, NaH2PO2 at 0.02 M, an ammonium salt at 0.27 M, and Na4P2O7 at 0.5 M was prepared. The pH of the electroplating solution was 8.4 and the temperature thereof was maintained at 40° C. As an anode, a cobalt plate was dipped in the electroplating solution and a current density was maintained at 5 mA / cm2. Therefore, a CoPtP alloy thin film was formed by using an electroplating method.
[0049]FIG. 4 shows a magnetic hysteresis curve of the CoPtP alloy thin film which was manufactured according to Experimental Example 3 of the present invention. The coercivity of the CoPtP alloy thin film was 5550 Oe and the squareness thereof was 0.76. Considering the above squareness, the CoPtP alloy thin film shows the best property among CoPtP alloy thin films that have been manufactured by using an electroplating method thus far.
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Abstract
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