Microlithographic projection exposure apparatus and measuring device for a projection lens

a technology of exposure apparatus and exposure lens, which is applied in the field of microlithographic projection exposure apparatus, can solve the problems of distortion of wave fronts passing through, fluctuations in the refractive index of immersion liquid, and unsatisfactory intensity fluctuations in the image plane, etc., and achieves efficient heat dissipation and high thermal conductivity.
US20080309894A1Inactive Publication Date: 2008-12-18CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
CARL ZEISS SMT GMBH
Publication Date
2008-12-18
Estimated Expiration
Not applicable · inactive patent

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Abstract

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
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Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This is a continuation-in-part of International Patent Application PCT / EP2005 / 000246, which was filed on Jan. 13, 2005 and claims benefit of U.S. provisional application Ser. No. 60 / 537,784 filed Jan. 20, 2004. The full disclosure of these earlier applications is incorporated herein by reference.BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The invention relates to microlithographic projection exposure apparatuses as used for manufacturing highly-integrated electrical circuits and other microstructured components. In particular, the invention relates to projection exposure apparatuses configured for immersion operation. The invention further provides measuring devices for determining the imaging properties of projection lenses.

[0004] 2. Description of Related Art

[0005] Integrated electrical circuits and other microstructured components are usually manufactured by applying a plurality of structured layers to a suitable subs...

Claims

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