Method for double-dip substrate spin optimization of coated micro array supports

Inactive Publication Date: 2011-11-17
UMEDIK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009](b) Allowing controlled modification of thin and ultra-thin coatings on a support while ef

Problems solved by technology

Importantly, there are practical limits to the evenness of a coating and thinness of the coating obtainable by spin coating methods.
Control of this ramp effect is difficult but desirable as it affects the relative unit volume density distribution of suspended particulates in the coating substrate film.
This method causes film thickness distribution to occur.
However, none of these methods adequately prevent unevenness and ramp effects in the film thickness generated in the substrate and manifested at marginal parts of the support.

Method used

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  • Method for double-dip substrate spin optimization of coated micro array supports

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0045]The uniformity of the epoxy coating was characterized using the following method.

[0046]Following immersion in cleaning solution, the support was centrifuged once, and then a second time in the opposite orientation, i.e., the clean support was rotated 180 degrees. The support was then immersed into a cleaning solution for a second time. The support was also centrifuged a third time, and a fourth time in the opposite orientation. The clean, dry support was then coated with appropriate substrate.

[0047]A fluorescent-labeled protein solution was placed over the entire epoxy surface.

[0048]After an appropriate incubation period, excess substrate coated onto the support was washed off and the substrate-coated support was dried. The substrate-coated support was then scanned in a fluorescence reader to measure and map the fluorescence intensity over the entire surface. Using computer software, the support surface was divided into a rectangular grid containing equal sized circles that we...

example 2

[0049]A clean substrate-coated support as known in the art is spun in a dust-free holding chamber on a motorized spindle. The spindle is preferably capable of speeds over 1000 rpm (100 g). Using conventional glass supports, the support is coated on both sides with an epoxysilane because of its environmentally compatible chemistry, a workable viscosity and surface tension at room temperature. The substrate-coated support is spun at a speed required to yield the desired even coating thickness, as substantiated by a plot shown for example in FIG. 2. The comparative spot density plots, confirm the substrate coating planarity, essentially a linearly changing thickness measure, indicating mitigation of what is known as the ramp effect, i.e., thinner coating at ID thicker coating at OD. This ramp effect is controlled by the degree to which material is brought to the surface of the disk. Surprisingly, centrifugal force applied to the double dip / double spin method however will result in plan...

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Abstract

Described is a method for preparing a substrate-coated support for use in micro-array devices. The method comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat, and subjecting the coated support to centripetal forces for a second time to produce a substrate-coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application is a continuation of co-pending U.S. patent application Ser. No. 11 / 999,276, filed Dec. 4, 2007, which application claims priority under 35 U.S.C. §119 to Canadian Patent Application No. 2,569,971, filed Dec. 4, 2006, the entire contents of each of which are hereby incorporated herein by this reference.TECHNICAL FIELD[0002]The invention relates to the field of micro-array assay technology. More particularly, the invention relates to methods for the preparation of substrate-coated micro-array supports. Even more particularly, the invention relates to the use of centripetal force to prepare coated micro-array support surfaces evenly coated with substrate.BACKGROUND[0003]Micro-array platforms are devices that comprise support material that is coated with a substrate to localize an assay reaction. A variety of support and coating materials have been used and are selected based on the nature of the assay for which the micro-arr...

Claims

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Application Information

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IPC IPC(8): B05D3/12
CPCB01J2219/00527B01J2219/00605B01L2300/16B01L3/50857B01L2200/12B01J2219/00637
InventorLEA, PETERLING, MINGFUHANSEN, JENNIFER
OwnerUMEDIK