Substrate processing device and substrate processing method for carrying out chemical treatment for substrate

Abstract

It is an object to reduce a chemical treating width in a peripheral edge part of a substrate while suppressing deterioration in each of uniformity of the chemical treating width and processing efficiency. In order to achieve the object, a substrate processing device for carrying out a chemical treatment for a substrate using a processing liquid having a reaction rate increased with a rise in temperature includes a substrate holding portion, a rotating portion for rotating the substrate held in the substrate holding portion in a substantially horizontal plane, a heating portion for injecting heating steam to a central part of a lower surface of the substrate to entirely heat the substrate, and a peripheral edge processing portion for supplying the processing liquid from above to a peripheral edge part of the substrate heated by the heating portion, thereby carrying out a chemical treatment for the peripheral edge part.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a substrate processing device and a substrate processing method for supplying a processing liquid to a substrate to carry out a chemical treatment such as etching while rotating the substrate. The substrate to be processed includes substrates, for example, a semiconductor wafer, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a substrate for a solar cell, and the like.[0003]2. Description of the Background Art[0004]Although a series of processing steps for a substrate such as a semiconductor wafer have a plurality of film forming steps for forming a thin film of a metal, a photoresist or the like on a front surface (“an upper surface”) of the substrate, a film is also formed on a back surface (“a lower surface”) of the substrate or a peripheral edge part of the upper surface of the substrate at the fil...

AI Technical Summary

Benefits of technology

The patent aims to provide a technique that can reduce the chemical treating width while maintaining uniformity and efficiency. This is achieved by heating the substrate with heating steam and supplying processing liquid to the peripheral edge part from above. This ensures that even a small amount of processing liquid can be effectively used. Additionally, the heating steam prevents water droplets from causing deterioration in non-processed regions on the substrate.

Problems solved by technology

In cases where the film is formed on the back surface of the substrate or the peripheral edge part of the upper surface of the substrate, a thin film formed on the peripheral edge part of the upper surface of the substrate may be peeled by contact with another device at a subsequent step to the film forming step, and may cause reduction in yield or a trouble of a substrate processing device itself.

According to the method, although an average etching width can be reduced, uniformity of the etching width is deteriorated, for example, the amount of wraparound of the processing liquid to the peripheral edge part is controlled with difficulty so that a portion to be etched locally and greatly appears.

Furthermore, there is also a problem in that the temperatures of the peripheral edge part and the processing liquid in the peripheral edge part are lowered, resulting in reduction in an etching rate.

However, there is a problem in that the etching rate in the peripheral edge part of the substrate is reduced due to decrease in the amount of the processing liquid and reduction in the temperature of the processing liquid in a pipe due to the decrease.

These are problems which are not limited to the etching using the etchant, but are caused in general processing for carrying out a chemical treatment for a substrate by using a processing liquid having a reaction rate increased with a rise in a temperature.

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