Automatic nail polish removing device and method
Patent Information
- Authority / Receiving Office
- US ยท United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- NULLA NAILS LTD
- Publication Date
- 2021-07-08
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
FIELD OF THE INVENTION
[0001] The present invention relates to the field of nail polish removing devices. More particularly, the invention relates to an automatic nail polish removing device and method, for both industrial and domestic use.BACKGROUND OF THE INVENTION
[0002] Nail polish, generally constituted by a film-forming polymer dissolved in a volatile organic solvent, has to be removed during a period of up to approximately a week after being applied to prevent unattractive chipping. There are generally two types of nail polish: a base coat polish to which a quick-drying top coat may be applied, and a long-lasting gel polish composed of a type of methacrylate polymer which is cured under an ultraviolet lamp but which is more difficult to remove than the base coat type.
[0003] Nail polish is removed with the use of a nail polish removing solution generally made of acetone, but which may also be made of ethyl acetate. The most widespread method for removing nail polish is performed by...