Overvoltage protection device and manufacturing process for the same
a protection device and manufacturing process technology, applied in semiconductor devices, semiconductor/solid-state device details, diodes, etc., can solve the problems of reducing the current carrying capacity of the device, affecting and still having drawbacks of the overvoltage protection device. , to achieve the effect of improving the sensitivity of the protection device for overvoltage surg
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first embodiment
[0027]Reference is made to FIG. 4A, which is a top-view diagram of the overvoltage protection device in accordance with the present invention. The upper portion of the semiconductor substrate 30 is surrounded by a circular voltage-limiting region 33a made of an N-type semiconductor. There is a gap located between the voltage-limiting region 33a and the base region 32 made of a P-type semiconductor. The emitter region 34 is disposed inside the base region 32. The multiple holes shown in the figure are emitter shorting dots 35. The emitter region 34 has a first electrode region 31 disposed thereon. In general, the first electrode region 31 is a metal layer used to connect with other components.
second embodiment
[0028]Reference is made to FIG. 4B, which is a top-view diagram of the overvoltage protection device in accordance with the present invention. The hatching 40 shown in this figure corresponds to the cutaway view shown in FIG. 3. The components of the present invention can be modified according to the practical requirements.
[0029]Therein, the upper portion of the semiconductor substrate 30 is surrounded by a semicircular voltage-limiting region 33b made of an N-type semiconductor. There is a gap located between the voltage-limiting region 33b and the base region 32 made of a P-type semiconductor. The emitter region 34 is disposed inside the base region 32 and has the multiple emitter shorting dots 35. The emitter region 34 has the first electrode region 31 disposed thereon.
third embodiment
[0030]Reference is made to FIG. 4C, which is a top-view diagram of the overvoltage protection device in accordance with the present invention. The hatching 40 shown in this figure corresponds to the cutaway view shown in FIG. 3. The present invention can be modified according to the practical requirements.
[0031]Therein, the upper portion of the semiconductor substrate 30 is surrounded by a semicircular segmented voltage-limiting region 33c made of an N-type semiconductor. There is a gap located between the voltage-limiting region 33c and the base region 32 made of a P-type semiconductor. The emitter region 34 is disposed inside the base region 32 and has the multiple emitter shorting dots 35. The emitter region 34 has the first electrode region 31 disposed thereon.
[0032]Taking FIG. 4C as an example, using segmented voltage-limiting region not only can reduce the total length of this voltage-limiting region but also can equally distribute the breakdown phenomenon to a longer length a...
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