4results about How to "Reduce injection" patented technology

This invention discloses a method and system for reducing white pixels generated by F-ion implantation on CIS products. The method includes the following steps: if the current injection gas source of the machine is a predetermined reducing gas source, determine if there is a batch of F-ion implantation. If so, switch the injection gas source to complete the first batch of F-ion implantation. Continue to determine if there is a second batch of F-ion implantation. If so, switch the gas source of the machine to the predetermined reducing gas source and process the corresponding product batch. After completing the corresponding product batch, switch the gas source of the machine again to process the second batch of F-ion implantation. This cycle is repeated until all batches requiring F-ion implantation are completed. This invention can effectively avoid the defect of white pixels and improve product quality.

The application discloses a processing method for improving process defects of an image sensor, and comprises the following steps: step 1, providing a substrate comprising a substrate, a polysilicon layer arranged above the substrate, a plurality of grooves arranged in the polysilicon layer, and a side wall formed on the side wall of the groove, wherein the side wall is a SiN layer; step 2, introducing an oxygen-containing gas, and the oxygen-containing gas reacts with the surface of the SiN layer to form SiO x N y ; step 3, cleaning the substrate by using a cleaning reagent; and step 4, forming a photoresist pattern above the substrate to expose the groove; and the SiO x N y , wherein x represents the atomic proportion of O, and y represents the atomic proportion of N. The method provided by the application can effectively clean and remove the tiny particles on the side wall of the groove, avoids the negative influence of the tiny particles on the subsequent photoresist exposure and development, ensures the accurate implementation of the subsequent P-type ion implantation process, is beneficial to reducing white pixels, and improves the performance of the image sensor chip.

The application discloses a method and system for reducing white pixel caused by F ion implantation on CIS products, wherein the method comprises the following steps: if the current machine implantation gas source is a predetermined gas source with reducing property, it is determined whether there is a batch of F ion implantation; if yes, the machine implantation gas is switched, and the first batch of F ion implantation is completed; it is continuously determined whether there is a second batch of F ion implantation; if yes, the machine switches the gas source, and the predetermined gas source with reducing property is implanted, and the corresponding product batch is processed; after the corresponding product batch is completed, the machine switches the gas source, and the second batch of F ion implantation is processed; the cycle is repeated until all batches of F ion implantation are completed. The application can effectively avoid the white pixel defect and improve the product quality.

This invention discloses an implicit MCP invocation method, system, and computer-readable storage medium. The method includes: converting and storing the description information of multiple MCPs into multiple MCP description vectors; receiving a user request and generating a query vector based on the user request; using the query vector to search, match, and score the multiple MCP description vectors, and selecting the MCP description vector with the highest comprehensive score for invocation. This invention reduces the injection of irrelevant MCP information by converting and storing the MCP description information into MCP description vectors and transforming the user request into a query vector, thus avoiding excessive occupancy of the limited context window by description information and improving the overall efficiency of data vocation. Users also do not need to remember or search for MCP names, optimizing the user experience. Furthermore, using the query vector to search, match, and score multiple MCP description vectors and selecting the MCP description vector with the highest comprehensive score for invocation improves the quality of the invocation response.