Method and structure for measuring thin-membrane strain
A thin film and measurement technology, applied in the direction of measuring devices, optical devices, instruments, etc.
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Embodiment 1
[0114] [Example 1] Straight arm type micro vernier strain gauge
[0115] See figure 1 Shown is the structural schematic diagram of the straight-arm micro-cursor strain gauge design. The straight arm micro cursor ruler strain gauge 100, its design concept is to use a pair of cantilever structural beams (length L A ), as the detection beams 102 and 104 to sense the residual strain of the film, and convert it into the deformation of the detection beams 102 and 104. Detect beams 102 and 104 to extend beam 110 (length L B ) Is connected to the central disc 106, and then the central disc 106 (radius R) and the index beam 108 (length L C ) To enlarge the deformation of the detection beams 102 and 104, and finally read the deformation of the index beam 108 with a micro vernier, and then use the deformation to match the geometric dimensions of the index beam 108 and the detection beams 102, 104, and calculate The residual strain value of the film to be tested. Since the residual strain is...
Embodiment 2
[0120] [Example 2] Arc arm micro vernier strain gauge
[0121] See figure 2 Shown is the structure diagram of the arc arm micro vernier strain gauge. The arc-arm microcursor strain gauge 200 uses a pair of arc-shaped cantilever detection beams 202, 204 with a radius of R opening angle θ to sense the residual strain of the film, and then through a linkage mechanism and an index beam 206 (length L), Convert the strains of the detection beams 202 and 204 into rotational displacements and enlarge them, and then read the enlarged rotational displacements with the microcursor, and then match the geometric dimensions of the index beam 206 to obtain the film to be measured after calculation The residual strain value. If the rotation of the microcursor ruler is also regarded as a small angle rotation, the relationship between its rotational displacement and the residual strain can be simplified as follows through geometric calculation:
[0122] ϵ = y...
Embodiment 3
[0130] [Example 3] High resolution arc arm micro vernier strain gauge
[0131] It has been found that the reason why the arc-arm micro vernier cannot be as good as the straight-arm micro vernier has a high resolution of about 10-5 is that in its measurement mechanism, the two structural beams are applied to the force arms of the index beam at the same time. It is also the radius of the circular arc arm, and the radius, the opening angle, and the arc length are dependent on each other, so after mathematical calculation, the amplification effect of the force arm will be eliminated. Therefore, when designing micro-cursor strain gauges, we must avoid such a situation. Under such considerations, the use of straight-arm micro-cursors is a better choice, but the high area of the straight-arm micro-cursor is occupied. Rate is the main factor limiting its application. However, if the advantages of the arc-arm micro-cursor and the advantages of the straight-arm micro-cursor can be capture...
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