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Carrying processing device

A treatment device and liquid treatment technology, which is applied in the direction of transportation and packaging, conveyor objects, electrical components, etc., can solve problems such as flow, failure and performance degradation, and achieve the effect of improving reuse rate, avoiding failure and performance degradation

Inactive Publication Date: 2009-03-04
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, as described above, in the transport processing apparatus having a structure in which the UV irradiation apparatus and the cleaning apparatus are adjacent, for example, when the substrate stops at a position straddling the UV irradiation apparatus and the cleaning apparatus for some reason, The problem that the cleaning liquid generated in the cleaning process flows from the cleaning device side to the UV irradiation device side on the substrate surface
[0006] At this time, the developing solution adheres to the lamp (not shown) of the UV irradiation device 50, which may lead to failure and performance degradation.

Method used

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Examples

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Embodiment Construction

[0018] Embodiments of the present invention will be described below with reference to the drawings.

[0019] figure 1 It is a schematic configuration diagram (partial) showing one embodiment of the transport processing device, figure 2 is a partial longitudinal sectional view of the decompression chamber.

[0020] In the transport processing device 1, such as figure 1 As shown, a decompression chamber 20 is disposed adjacent to the developing device 10 as a wetting unit. The glass substrate W passes through these developing devices 10 and the decompression chamber 20 by the conveyance rollers 2 . . .

[0021] In addition, various processing devices (not shown) are arranged in the preceding and subsequent stages of the developing device 10 and the decompression chamber 20 .

[0022] In the developing device 10 , a substrate inlet 12 and a delivery outlet 13 are formed in a box-shaped casing, and a developer supply nozzle 14 is arranged inside the casing. Also, an exhaust ...

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Abstract

The present invention provides a conveying processing apparatus capable of avoiding liquid from a wet unit. An outlet (23) of a decompression chamber (20) has a vertical size set within a range avoiding contact of its top edge with the liquid (developing solution) supplied on the surface of a substrate (W). Therefore, because the clearance between the top face of the substrate (W) and the top edge of the outlet (23) becomes small when the substrate (W) passes through the outlet (23) and the interior of the decompression chamber (20) has a negative pressure, atmosphere rushes into the decompression chamber (20) along the top surface of the substrate (W) so that the flow of the atmosphere causes the developing solution put on the surface of the substrate (W) to flow and fall from the long side of the substrate (W). The developing solution thus caused to flow and fall is collected through a collection port (24).

Description

technical field [0001] The present invention relates to a transport processing device that performs various processes while transporting substrates such as glass substrates by rollers or the like. Background technique [0002] Conventionally, as shown in Patent Document 1, there is known a conveyance processing apparatus in which various processing apparatuses are arranged along a substrate conveyance line in order to improve processing efficiency, and various processes are performed while conveying a glass substrate or the like by rollers or the like. [0003] In such a conveyance processing apparatus in which various processing apparatuses are arranged along the substrate conveyance line, for example, a cleaning apparatus (wetting unit) is also disposed downstream of the UV irradiation apparatus (drying unit), and the substrate is sent to the UV irradiation apparatus. And after removing the organic matters adhering to the surface, the surface of the glass substrate is clea...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/677H01L21/027H01L21/00G03F7/30
CPCH01L21/67028H01L21/67051H01L21/6715H01L21/67706
Inventor 岛井太河田茂
Owner TOKYO OHKA KOGYO CO LTD