Liquid crystal medium
A technology of liquid crystal medium and medium, applied in liquid crystal materials, optics, instruments, etc., can solve the problem of high resistance
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Embodiment 1
[0308] ME2N.F 3.00% Clearing point [°C]: +80.5
[0309] ME3N.F 3.00% Δn[589nm, 20°C]: +0.0798
[0310] ME4N.F 2.00% d·Δn[20°C, μm]: 0.50
[0311] CCP-2F.F.F 10.00% Twist [°]: 90
[0312] CCP-3F.F.F 10.00% V 10 [V]: 1.01
[0313] CCP-5F.F.F 10.00%
[0314] CDU-2-F 10.00%
[0315] CDU-3-F 10.00%
[0316] CDU-5-F 10.00%
[0317] CCG-V-F 21.00%
[0318] CH-33 3.00%
[0319] CH-35 3.00%
[0320]CH-43 3.00%
[0321] CH-45 2.00%
Embodiment 2
[0323] PCH-3N.F.F 1.00% Clearing point[°C]: +80.0
[0324] ME2N.F 9.00% Δn[589nm, 20°C]: 0.1379
[0325] ME3N.F 9.00% HTP [1 / μm, 20°C]: -13.87
[0326] ME4N.F 15.00% d·Δn[20°C, μm]: 0.85
[0327] ME5N.F 13.00% Twist [°]: 240
[0328] HP-3N.F 6.00% V 10 [V]: 0.76
[0329] HP-4N.F 5.00% V 90 / V 10 : 1.119
[0330] HP-5N.F 5.00%
[0331] CDU-2-F 9.00%
[0332] CDU-3-F 9.00%
[0333] CDU-5-F 8.00%
[0334] CCPC-33 4.00%
[0335] CCPC-34 4.00%
[0336] CCPC-35 3.00%
Embodiment 3
[0338] PCH-3N.F.F 1.00% Clearing point[°C]: +80.0
[0339] PZU-V2-N 13.00% Δn[589nm, 20°C]: 0.1369
[0340] ME2N.F 9.00% HTP [1 / μm, 20°C]: -13.87
[0341] ME3N.F 9.00% d·Δn[20°C, μm]: 0.85
[0342] ME4N.F 10.00% Twist[°]: 240
[0343] ME5N.F 5.00% V 10 [V]: 0.70
[0344] HP-3N.F 6.00% V 90 / V 10 : 1.119
[0345] HP-4N.F 5.00%
[0346] HP-5N.F 5.00%
[0347] CDU-2-F 9.00%
[0348] CDU-3-F 9.00%
[0349] CDU-5-F 8.00%
[0350] CCPC-33 4.00%
[0351] CCPC-34 4.00%
[0352] CCPC-35 3.00%
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