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Vacuum processing device, diagnostic method for static electricity chuck and storing medium

A technology of vacuum processing device and electrostatic chuck, which is applied to positioning devices, circuits, electrical components, etc., can solve problems such as electrostatic damage and achieve the effect of preventing damage

Inactive Publication Date: 2009-07-29
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, electrostatic chucks in which the dielectric layer is prone to dielectric breakdown due to moisture absorption may cause electrostatic breakdown when a chuck voltage is applied to the chuck electrodes, so the above-mentioned problems cannot be solved.

Method used

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  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium
  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium
  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium

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Embodiment Construction

[0091] refer to Figure 1 ~ Figure 3 , an embodiment in which the vacuum processing apparatus of the present invention is applied to a plasma processing apparatus for etching a glass substrate for a liquid crystal display will be described. figure 1 is an example of the plasma processing apparatus 1 . For example, the plasma processing apparatus 1 has a processing container 11 composed of a vacuum container whose interior is a sealed space, an antenna container 51 provided on the upper part of the processing container 11, and a gas shower provided between the processing container 11 and the antenna container 51. The head 41 is the mounting table 2 arranged to face the gas shower head 41 at the center of the bottom surface of the processing chamber 11 .

[0092] A mounting table 2 and a hollow support 16 supporting the mounting table 2 and containing piping and the like are housed in the processing container 11 , and an exhaust device 13 including a vacuum pump and the like is...

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Abstract

A vacuum processing apparatus, a method for diagnosing an electrostatic chuck, and a recording medium storing a program for performing the method are provided to diagnose the insulation state of a dielectric layer accurately before using the electrostatic chuck in vacuum treatment of a substrate. An electrostatic chuck(22) is adapted to suck and hold a glass substrate(G). A high voltage DC power source(67) applies a diagnosis voltage, which is lower than a voltage when the glass substrate is sucked, to a chuck electrode(24) of the electrostatic chuck. Respective measuring units(70,71) obtain measurement data of electric properties at measurement positions of the electrostatic chuck. A controller(80), functioning as a diagnosing part, compares the measurement data with predetermined set data to diagnose whether the electrostatic chuck is usable.

Description

technical field [0001] The present invention relates to a technique for diagnosing whether or not an electrostatic chuck provided in an apparatus for performing vacuum processing such as plasma processing on a substrate, such as a glass substrate of a flat panel display (FPD), when the operation of the apparatus is started. Background technique [0002] When forming a plurality of thin film transistors (Thin Film Transistor: TFT) on a glass substrate, the process of manufacturing a liquid crystal display which is one type of FPD includes a process of performing plasma treatment such as CVD or etching on the glass substrate. [0003] In the plasma processing step, a plasma processing apparatus is generally used, which arranges a pair of parallel plate-shaped electrodes facing up and down in a vacuum processing container (vacuum container), and applies high-frequency power between these electrodes to make the The processing gas introduced into the device is plasma-treated, and...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/67H01L21/683C23C16/458B23Q3/15
CPCG02F1/1303H01L21/02252H01L21/6831H01L2224/8009
Inventor 古屋敦城里吉务
Owner TOKYO ELECTRON LTD
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