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Stage apparatus, lithographic apparatus and device manufacturing method

A workbench and photolithography technology, which is applied in semiconductor/solid-state device manufacturing, photolithography process exposure devices, printing devices, etc., can solve problems such as the impact of device productivity

Inactive Publication Date: 2009-12-23
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Despite the use of multiple patterning parts on a single stage, existing exposure methods still have a significant impact on device productivity

Method used

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  • Stage apparatus, lithographic apparatus and device manufacturing method
  • Stage apparatus, lithographic apparatus and device manufacturing method
  • Stage apparatus, lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0061] Figure 1a schematically shows a photolithographic apparatus comprising:

[0062] An illumination system (which can also be referred to as an illuminator) IL for conditioning a radiation beam B (for example UV radiation or DUV radiation).

[0063] a support structure (e.g. mask table) MT configured to support a patterning member (e.g. mask) MA and connected to a first positioner PM for precise positioning of the patterning member according to certain parameters;

[0064] a substrate table (e.g. wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW for precise positioning of the substrate according to certain parameters; and

[0065] A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning means MA onto a target portion C of the substrate W (eg comprising one or more dies).

[0066] Illumination systems may include va...

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PUM

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Abstract

In order to increase the productivity of the lithographic apparatus, a stage arrangement for holding two patterning components is described. These patterning components are arranged such that the spacing of the pattern along the scanning direction corresponds to the length of the pattern along the scanning direction. By doing so, improvements can be made by exposing a first die with a first pattern, across a second die adjacent the first die, and exposing a third die adjacent the second die with a second pattern. exposure sequence.

Description

technical field [0001] The invention relates to a workbench device, a lithography device, a masking device and a method for manufacturing the device. Background technique [0002] A lithographic apparatus is an apparatus that applies a desired pattern to a substrate, typically a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, which may alternatively be referred to as a mask or reticle, may be used to create a circuit pattern formed on a single layer of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) of a substrate (eg, a silicon wafer). The pattern is usually transferred by imaging onto a layer of radiation sensitive material (resist) provided on the substrate. Generally, a single substrate will contain a grid of adjacent target portions patterned in succession. Known lithographic apparatuses inc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/00
CPCG03B27/58G03F7/70716G03F7/70425
Inventor E·R·卢普斯特拉A·J·布利克H·M·穆尔德O·F·J·努尔德曼T·F·森格斯L·C·乔里特斯马M·特伦特尔曼G·斯特鲁特克
Owner ASML NETHERLANDS BV