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Chemical vapor deposition apparatus for flat display

A chemical vapor deposition and flat panel display technology, applied in gaseous chemical plating, instruments, optics, etc., can solve problems such as productivity decline, equipment operation speed reduction, process loss, etc.

Inactive Publication Date: 2010-01-20
SFA ENG CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the operating rate of the equipment is lowered, and thus the productivity is lowered, resulting in a process loss

Method used

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  • Chemical vapor deposition apparatus for flat display
  • Chemical vapor deposition apparatus for flat display
  • Chemical vapor deposition apparatus for flat display

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Embodiment Construction

[0045] Reference is made to the accompanying drawings for illustrating preferred embodiments of the invention in order to fully understand the invention, its advantages and objects achieved by practicing the invention.

[0046] Hereinafter, the present invention will be described in detail by explaining preferred embodiments of the invention with reference to the accompanying drawings. Like reference numerals in the drawings refer to like elements.

[0047] figure 1 The structure of a chemical vapor deposition apparatus for a flat panel display according to an embodiment of the present invention will be described. refer to figure 1 , a chemical vapor deposition apparatus 1 for a flat panel display comprises: a chamber 10; an electrode 16 provided in an upper portion of said chamber 10 and emitting predetermined reactive gas ions to a flat panel display G subjected to deposition; a susceptor 30, which is arranged under the electrode 16 and loads the flat panel display G on t...

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Abstract

A chemical vapour deposition (CVD) equipment used for flat panel display comprises a foundation bed mounted inside a chamber and having an upper surface on which a flat panel display for deposition is loaded; and a cooling part which is buried in at least one part of the foundation bed and is used for enforcedly cooling the foundation bed that has been heated during the deposition process. Since the enforced cooling of foundation bed can reduce the foundation bed temperature to an appropriate level in a relatively short time, the stand-by period for facility maintenance and pipeline time can be reduced. Therefore, the manipulation velocity and productivity of the equipment is improved, and the process loss is prevented from occurring.

Description

technical field [0001] The present invention relates to a chemical vapor deposition apparatus for a flat display, and more particularly, to a method for forcibly cooling the temperature of a susceptor to an appropriate level in a relatively short period of time to reduce the CVD equipment for flat panel displays with maintenance / repair equipment wait times. Therefore, productivity is improved, and occurrence of process loss is limited. Background technique [0002] Flat panel displays have been widely used in products such as personal portable terminals, televisions, and computer monitors. There are various types of flat panel displays, such as cathode ray tube (cathode ray tube, CRT), liquid crystal display (liquid crystal display, LCD), plasma display panel (plasma display panel, PDP) and organic light emitting diode (organic light emitting diode, OLED). [0003] A CRT or so-called Braun tube is a device for forming images by converting electrical signals into optical i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44C23C16/458C03C17/00
CPCC23C16/44H01L21/68714H01L21/67207G02F1/13C23C16/505H10K50/00H01L21/0262
Inventor 金南珍李相张祥来李相
Owner SFA ENG CORP
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