Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method

一种缺陷检查、制造方法的技术，应用在测量装置、图纹面的照相制版工艺、半导体/固态器件制造等方向，能够解决检查结果改变等问题，达到提高生产率的效果

Inactive Publication Date: 2007-10-03
HOYA CORP
View PDF1 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, since there is a problem that such visual inspection causes changes in inspection results depending on the operator, automatic defect inspection using defect inspection equipment is required

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
  • Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
  • Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0056] [A] First Embodiment (FIGS. 1 to 7B)

[0057] FIG. 1 is a schematic side view showing a defect inspection apparatus for performing a defect inspection method according to a first embodiment of the present invention. FIG. 2 is a schematic side view showing a modified example of the defect inspection apparatus shown in FIG. 1 . 5 is a plan view showing a photomask to be inspected as an inspection object in the defect inspection method shown in FIGS. 1 and 2 .

[0058] As shown in FIG. 5, in the defect inspection method of this embodiment, a photomask 50 to be inspected as an inspection object is an exposure mask for manufacturing a substrate such as a liquid crystal display (in particular, a flat panel). Display: Display device of FPD), plasma display, EL display, LED display or DMD display.

[0059] The photomask 50 includes a transparent substrate such as a synthetic quartz glass substrate and a thin film (light shielding film) such as a chromium film formed on the su...

no. 2 example

[0094] [B] Second Embodiment (FIG. 8)

[0095] 8 is a side sectional view showing a photomask to be inspected in a defect inspection method of a second embodiment of the present invention. The second embodiment is different from the first embodiment described above in that the defect inspection process is performed after the resist pattern forming process, and thereafter, the process of removing the resist pattern for the auxiliary pattern 57 and forming the mask are performed in a specified order. The process of molding the pattern (ie, the thin film pattern of the main pattern 56).

[0096] That is, in the resist pattern forming process, the resist patterns 61 and 62 for forming the main pattern 56 and the auxiliary pattern 57 are respectively written on the thin film 60 formed on the surface of the transparent substrate 59 using a writing device according to a grating writing technique. formed on the resist film and then developed.

[0097] In the defect inspection proces...

no. 3 example

[0103] The auxiliary pattern removal process of the pattern defect inspection method according to the third embodiment is different from the second embodiment described above.

[0104] That is, in this third embodiment, etching is performed after defect inspection using the resist pattern 62 for the auxiliary pattern 57 to form a thin film pattern of the main pattern 56 (ie, the main pattern 56 in the first embodiment) and a thin film pattern of the auxiliary pattern 57 (ie, the auxiliary pattern 57 in the first embodiment), and then strip the resist, thereby manufacturing a temporary photomask.

[0105] Thereafter, a resist is coated again on the entire surface of the temporary photomask, and then only a portion of the resist corresponding to the auxiliary pattern 57 is exposed. The exposure may be scanning exposure by a scribing device, or surface exposure only at such a portion. Development is performed again after exposure, and then etching is performed again, thereby rem...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A defect inspection method is adapted to inspect a defect generated in a main pattern of a photomask. The main pattern includes a repetitive pattern in which unit patterns are periodically arranged. The method forms, an auxiliary pattern for inspection simultaneously with forming the main pattern. The auxiliary pattern includes a repetitive pattern having a period different from that of the main pattern. The method irradiates a light onto the auxiliary pattern at a predetermined incident angle and receives diffracted light generated by the auxiliary pattern by an observation apparatus to detect a defect of the auxiliary pattern, thereby determining the presence of a defect of the main pattern.

Description

technical field [0001] The present invention relates to a pattern defect inspection method for inspecting defects in a repeated pattern of an inspection object, a photomask manufacturing method for manufacturing a photomask by performing such defect inspection, and a method using the Photomask Production A display device substrate manufacturing method of a substrate for a display device (hereinafter also referred to as a "display device substrate"). Background technique [0002] For a display device substrate as an inspection object or a photomask used for manufacturing a display device substrate as an inspection object, it is necessary to inspect a defect in a pattern formed on the surface thereof. Such defects in the pattern include errors that cause irregularities to appear unintentionally in a regularly arranged pattern of cells. This may also be referred to as an irregularity defect and is due to something in the manufacturing process or the like. [0003] If a defect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/00H01L21/027G01N21/956G03F1/42G03F1/68G03F1/84
CPCG03F1/84G03F1/44G03F1/14G03F1/0092G03F1/82G03F1/68G03F1/62
Inventor 山口升
Owner HOYA CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com