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Etching apparatus for glass plate and method of glass etching using the same

An etching equipment and etching technology are applied in the field of equipment for etching substrates with a uniform thickness, which can solve the problems that the substrate cannot be etched uniformly and impurities are generated

Inactive Publication Date: 2007-10-31
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, when the substrate is etched with conventional etching equipment, impurities are generated, so that the substrate cannot be etched uniformly

Method used

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  • Etching apparatus for glass plate and method of glass etching using the same
  • Etching apparatus for glass plate and method of glass etching using the same
  • Etching apparatus for glass plate and method of glass etching using the same

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Embodiment Construction

[0036] The invention will be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. However, this invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity.

[0037] It will be understood that when an element or layer is referred to as being "on," "connected to," or "coupled to" another element or layer, it may be directly on, or directly connected to, the other element or layer. , coupled to another element or layer, intervening elements or layers may also be present. In contrast, when an element is referred to as being "directly on," "directly connected to" or "directly ...

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PUM

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Abstract

A device comprises an etching container, a number of air bubbles injectors and a gas supply machine. The etching container arranges two or more glass substrates at the pars basilaris ossis occipitalis in parallel, and accommodates them in it vertically and mutually. The air bubbles injector intervenes between said each glass substrate and injects air bubbles to a glass substrate accommodated in said etching container. The gas supply machine is arranged to the exterior of said etching container and supplies gas to said cellular injector. Thus, the air bubbles can be uniformly injected into the glass substrates, therefore the uniform etching can be performed on the glass substrates.

Description

technical field [0001] The present invention relates to apparatus and methods for etching substrates. More particularly, the present invention relates to apparatus and methods for etching substrates with uniform thickness. Background technique [0002] Generally, a liquid crystal display (LCD) device includes an LCD panel having a thin film transistor (TFT) substrate, a color filter substrate facing the TFT substrate, and a liquid crystal layer disposed between the TFT substrate and the color filter substrate. [0003] Recently, with increasing demand for mobile electronic devices such as mobile terminals, multimedia players, laptop computers, etc., LCD devices are becoming more popular due to their light weight. [0004] In an LCD device, the weight of a glass substrate such as a TFT substrate and a color filter substrate accounts for a large part of the weight of the LCD device. Therefore, etching equipment is generally used to reduce the thickness of the glass substrate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 金景满
Owner SAMSUNG DISPLAY CO LTD
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