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Aromatic diacid ester acetal polymer, synthetic method and use thereof

A technology of aromatic diacid ester and acetal polymer, which is applied in the field of polymer materials and can solve the problems of increasing the difficulty of synthesis

Inactive Publication Date: 2008-01-16
BEIJING NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in order to enhance the plasma etching resistance of the photoresist film layer, the copolymer needs to introduce a large number of alicyclic structures, which increases the difficulty of synthesis

Method used

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  • Aromatic diacid ester acetal polymer, synthetic method and use thereof
  • Aromatic diacid ester acetal polymer, synthetic method and use thereof
  • Aromatic diacid ester acetal polymer, synthetic method and use thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Example 1 Reaction of 1,4-naphthalene dicarboxylic acid with 1,4-divinyloxymethylcyclohexane (cyclohexyldimethanol divinyl ether)

[0038] Add 21.6g (0.1mol) of 1,4-naphthalene dioic acid and 19.6g (0.1mol) of 1,4-divinyloxymethylcyclohexane into a 250ml four-necked flask equipped with mechanical stirring, a thermometer, and a condenser (Cyclohexyl dimethyl divinyl ether), add 41ml of 1,4-dioxane, heat and stir, raise the temperature to 120°C-130°C, and stir for 3 hours to complete the reaction.

[0039] Product Determination Infrared Spectrum Visible 3400cm -1 Absorption of nearby carboxylic acids basically disappears, 1690cm -1 Carbonyl absorption of nearby carboxylic acid disappears, 1720cm -1 The carbonyl absorption of the ester group occurs nearby. Indicates that the reaction is complete.

Embodiment 2

[0040] Example 2 Reaction of isophthalic acid with 1,4-divinyloxymethylcyclohexane (cyclohexyldimethanol divinyl ether)

[0041] Add 16.6g (0.1mol) of isophthalic acid and 19.6g (0.1mol) of 1,4-divinyloxymethylcyclohexane (cyclohexyl Dimethyl divinyl ether), add 36ml of 1,4-dioxane, heat and stir, raise the temperature to 120°C-130°C, and stir the reaction for 3 hours to end.

[0042] Product Determination Infrared Spectrum Visible 3400cm -1 Absorption of nearby carboxylic acids basically disappears, 1690cm -1 Carbonyl absorption of nearby carboxylic acid disappears, 1720cm -1 The carbonyl absorption of the ester group occurs nearby. Indicates that the reaction is complete.

Embodiment 3

[0043] Example 3 Reaction of terephthalic acid with 1,4-divinyloxymethylcyclohexane (cyclohexyldimethanol divinyl ether)

[0044] Add 16.6g (0.1mol) of terephthalic acid and 19.6g (0.1mol) of 1,4-divinyloxymethylcyclohexane (cyclohexyl Dimethyl divinyl ether), add 36ml of 1,4-dioxane, heat and stir, and raise the temperature to 120-130°C, and the stirring reaction is completed for 24 hours.

[0045] Product Determination Infrared Spectrum Visible 3400cm -1 Absorption of nearby carboxylic acids basically disappears, 1690cm -1 Carbonyl absorption of nearby carboxylic acid disappears, 1720cm -1 The carbonyl absorption of the ester group occurs nearby. Indicates that the reaction is complete.

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Abstract

The invention relates to various aromatic diacid ester acetal polymers and a synthesis method of the aromatic diacid ester acetal polymers. Various aromatic diacids and various divinyl ether compounds are heated to react in organic solvent to obtain novel ester acetal polymers. The above-mentioned polymers are easy to have acid decomposition reaction. Therefore, the acetal polymers and photoacid generators can be used together to compose a novel positive photographic imaging materials which can be used as photoresist used in super large scale integrated circuit process and can be used as imaging materials for printing PS plate or CTP plate.

Description

technical field [0001] The technical field of the present invention is the field of high molecular polymer materials, that is, a new type of ester acetal polymer and its synthesis method. Specifically, aromatic diacids and divinyl ether compounds react under certain conditions to form ester acetal polymers. Such polymers are prone to acid-induced decomposition reactions, so they can be used together with photoacid generators to form chemically amplified photosensitive polymers. imaging material. This new type of photosensitive imaging material can be used for deep ultraviolet positive photoresist (also known as photoresist) for VLSI and photosensitive and thermal imaging composition for computer-to-plate (CTP) for printing. Background technique [0002] The imaging principle of a common photoresist is to protect alkali-soluble groups such as phenolic hydroxyl groups and carboxyl groups into acid-dissociable groups, such as ester groups or acetals. These acid-dissociable gr...

Claims

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Application Information

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IPC IPC(8): C08G63/66
Inventor 王力元霍永恩
Owner BEIJING NORMAL UNIVERSITY
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