Device for leading-in inside and outside differential pressure step by step of magnetron sputtering vacuum chamber H2O
A technology of internal and external pressure difference and magnetron sputtering, which is applied in the directions of sputtering coating, vacuum evaporation coating, ion implantation coating, etc., and can solve the problems of moisture, unable to vacuumize and work normally, etc.
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[0014] Such as figure 1 Shown, the embodiment of the present invention is made of sealed suction filter bottle 1, H 2 O gasification guide pipe 2, the first stage H 2 O gasification buoy flowmeter 3, second stage gasification buoy flowmeter 4, third stage H 2 O gasification is composed of a buoy flowmeter 5, a digital flow controller 6, a flow indicator 7, and a gas mixing chamber 8, and the sealed suction filter bottle 1 passes through the H 2 O gasification guide pipe 2 and the first stage H 2 O gasification with float flow meter 3 connection, first stage H 2 O gasification with float flowmeter 3 and then through H 2 The O gasification guide pipe 2 is connected with the buoy flowmeter 4 for the second-stage gasification, and the buoy flowmeter 4 for the second-stage gasification passes through the H 2 O gasification guide pipe 2 and the third stage H 2 O gasification is connected with float flowmeter 5, the third stage H 2 O gasification with float flowmeter 5 through...
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