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Single, right-angled end-block

An end block and target technology, applied in the field of end blocks

Inactive Publication Date: 2008-03-05
SOLERAS ADVANCED COATINGS NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

One of the disadvantages of using these tubular targets in this display coating setup is that it requires profound changes to currently existing equipment

Method used

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  • Single, right-angled end-block
  • Single, right-angled end-block

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] FIG. 1 is a perspective view showing how an end block of the present invention is mounted to a wall or door of a sputtering apparatus. The end block 100 is mounted to the wall 110 of the sputtering apparatus at an end block flange 120 . From outside the device, a drive means (in this example a timing belt 130) causes the mounting flange 170 to rotate. A target (not shown) is seated on this flange and is detachably attached thereto by an interface ring 160 . The coolant supply device 140 and the withdrawal device 150 are externally connected to the flange hole 180 . Inside this bore, the coolant supply and return are separated from each other (not visible). A magnetic rod (not shown) is also inserted and held within this hole.

[0042] Figure 2 shows a schematic cross-sectional view of a preferred embodiment. The end block 200 combines drive means, rotating electrical contact means, support means, coolant seal means and vacuum seal means in a single housing 201 . Th...

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PUM

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Abstract

A single, right-angled end-block is claimed for rotatably carrying a target in a sputtering apparatus. The end-block comprises all necessary means to drive, energise, bear and seal (coolant and gas) the target in the sputtering apparatus from the outside through a single opening in a wall or door. The right-angled end-block rotates the target around an axis of rotation that is parallel to the wall on which the target is mounted. By preference the end- block is situated below the target in order to allow easy drainage of the coolant.

Description

field of invention [0001] The invention relates to an end block for rotatably carrying a sputtering target in a sputtering device. More particularly, the present invention relates to an all-in-one end block for feeding, with the target mounted substantially parallel to the end block flange through which the target is mounted to the wall of the sputtering device. Background technique [0002] "Sputter deposition" or "sputtering" is a plating process in which atoms are dislodged from a target by striking it with dynamic ions, and these atoms are then ejected onto a substrate. Ions are generated in a free-electron plasma excited in a low-pressure sputtering gas (usually a noble gas of high atomic mass such as argon) by a voltage difference between the cathode target and the anode. This voltage difference also accelerates the ions to a high kinetic energy moving towards the target. Only a small portion of the kinetic energy of the ions is used to dislodge the target atoms; mos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34H01J37/34
CPCH01J37/3405C23C14/3407H01J37/3497C23C14/35C23C14/54H01J37/3435
Inventor K·德拉尔特W·德博斯谢尔J·德贝维尔G·拉佩尔
Owner SOLERAS ADVANCED COATINGS NV