Optical thin sheet with reinforced structur

A technology of optical flakes and structures, applied in optics, nonlinear optics, coatings, etc., can solve problems such as defect rate and poor transmittance of glass substrates

Inactive Publication Date: 2008-05-14
ETERNAL MATERIALS CO LTD
View PDF1 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although the inclusion of an inorganic layer in the protective layer can improve the adhesion between the protective layer and the glass substrate, it may cause the li

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical thin sheet with reinforced structur
  • Optical thin sheet with reinforced structur
  • Optical thin sheet with reinforced structur

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0064] The polyacrylate resin of Example 1 was prepared with monomers, solvents and appropriate initiators in different proportions, and the preparation conditions are shown in Table 1:

[0065] Table 1

[0066] Mixture

Embodiment 1

[0068] The polyacrylate resin prepared above is reacted with a hardener and other solvents to prepare the thermosetting resin of the protective layer of the present invention. The preparation conditions are shown in Table 2:

[0069] Table 2

[0070] Raw materials

preparation example 2-3

[0072] The fluorocarbon resin of Example 2 was prepared with different ratios of monomers, solvents, and appropriate initiators. The preparation conditions are shown in Table 3:

[0073] table 3

[0074] Preparation Example 2

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an optical wafer, which comprises a basis material and at least one protection layer. The protection layer is positioned on at least one surface of the basis material and has an organic layer, and the organic layer comprises a thermosetting resin used for increasing the basis material toughness. The protection layer and the basis material have good adherence with each other. The optical wafer protected by the protection layer can not produce warp and has high optical transparency.

Description

Technical field [0001] The present invention relates to an optical sheet, especially an optical sheet with a reinforced structure. Background technique [0002] At present, electronic products have developed towards lightness and thinness. Since cathode ray tubes (CRT) cannot achieve lightness and thinness and low power consumption, liquid crystal displays (LCD), plasma display panels (PDP), and electroluminescence are gradually being used. Display (electroluminescent display; ELD), vacuum fluorescent display (vacuum fluorescent display) and other flat-panel displays are replaced. Among them, the liquid crystal display has become the mainstream of the market due to its advantages of high image quality, low radiation, low power consumption, and better space utilization. [0003] The method used to make the liquid crystal display thinner and lighter is nothing more than thinning the glass substrate that accounts for a certain weight in the liquid crystal display, or replacing the g...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02F1/1333C08J7/04C08L33/04C08L69/00C08L25/06C08L79/08C08L67/00
Inventor 叶茂荣李金木张俊雄
Owner ETERNAL MATERIALS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products