Resistor structure and its forming method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- TAIWAN SEMICON MFG CO LTD
- Publication Date
- 2008-07-16
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Abstract
Description
technical field
[0001] The present invention relates to integrated circuit design, and in particular to a stacked resistor structure suitable for use in integrated circuits. Background technique
[0002] An integrated circuit often contains many resistors. For example, an analog-to-digital converter (ADC) may include groups of resistors to divide the voltage. Ideally, the resistance values of these resistor groups should be matched to divide the voltage equally. Traditionally, the above-mentioned resistors are manufactured by forming some silicide or non-silicide polysilicon layers on a silicon wafer; the above-mentioned resistors can also be manufactured by forming N-type or P-type doped regions on the semiconductor substrate of the wafer. device.
[0003] One of the disadvantages of the conventional resistors described above is that they require a large surface area. For example, for a reference voltage resistor-ladder used in an 8-bit analog-to-digital converter, th...