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Method and system for detecting photo mask, computer readable storage medium

A photomask, exposure technology, applied in computing, originals for optomechanical processing, optics, etc., can solve problems such as the impact of production yield

Active Publication Date: 2011-01-26
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to this ongoing progress, even very small defects on photomasks can negatively impact production yield

Method used

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  • Method and system for detecting photo mask, computer readable storage medium
  • Method and system for detecting photo mask, computer readable storage medium
  • Method and system for detecting photo mask, computer readable storage medium

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Embodiment Construction

[0018] In order to make the purpose, features, and advantages of the present invention more comprehensible, preferred embodiments are specifically cited below and described in detail with accompanying drawings.

[0019] The present invention relates to a photolithography system and a method for analyzing photomask defects for a photolithography system. The description of the present invention provides different examples to illustrate the technical features of different implementations of the present invention. Wherein, the configuration of each element in the embodiment is for illustration, not for limiting the present invention. In addition, part of the symbols in the figures in the embodiments are repeated for the purpose of simplifying the description, and do not imply the relationship between different embodiments.

[0020] Referring to FIG. 1 , it shows a system 100 for analyzing defects in a semiconductor photomask according to an embodiment of the present invention. T...

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Abstract

Provided is a method and a system for detecting the photomask, a computer readable storage medium. The method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first photomask image is detected from the transmitted portion of the radiation transmitted through the photomask and perceptible at a second side of the photomask. A second photomask image is created by applying an exposure simulation model to a photomask design. A difference between the first photomask image and the second photomask image is then determined. The invention can detect the defect of the photomask.

Description

technical field [0001] The present invention relates to photomask defect analysis. Background technique [0002] Semiconductor lithography processes use photomasks for patterning. Integrated circuit (IC) technology continues to advance to circuit layouts with tiny feature lines and increased densities. As a result of this continued progress, even very small defects on photomasks can negatively impact production yield. Contents of the invention [0003] To overcome the deficiencies of the prior art, the present invention provides a method of inspecting a photomask, which includes directing light from a light source into a first side of a photomask such that at least a portion of the light is transmitted through the light Mask transfer. A first photomask image is detected from a portion of the light transmitted through the photomask and viewable from a second side of the photomask. A second photomask image is generated by applying an exposure simulation model to a photom...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/00G03F1/00G03F7/20
CPCG06T2207/30148G06T7/001G03F1/84
Inventor 黄良荣段成龙
Owner TAIWAN SEMICON MFG CO LTD