Gantry type light shield cleaning device

A cleaning device and gantry-type technology, applied in the field of gantry-type cleaning photomask devices, can solve the problems of no air knife device, weak cleaning air, limited effect, etc., to avoid close contact, avoid multiple contacts, The effect of high cleaning uniformity

Inactive Publication Date: 2008-10-08
CENTURY DISPLAY (SHENZHEN) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A kind of conveying and dedusting device for substrates, although it has the cleaning function of the present invention, but the dedusting unit of this patent does not have an air knife device like the present invention, and the washing air sprayed out by it is relatively weak, and the dedusting unit It also cannot move freely, so when cleaning, it is difficult to clean the particles on the surface of the substrate evenly, and the effect is limited in implementation
[0005] Also have Taiwan Publication No. I287472 patent is a kind of dust cleaner, although also relevant with the present invention, it also does not have air knife device, only will dust be taken away by air ejection chamber and air suction chamber, and washing air only It can be sprayed through a spray gap, in other words, the spray direction is only one direction, so the cleaning effect is also limited

Method used

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  • Gantry type light shield cleaning device
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  • Gantry type light shield cleaning device

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Embodiment Construction

[0049] The invention is a gantry-type photomask cleaning device, which is designed for cleaning particles or impurities on the photomask, and can replace the conventional manual cleaning method, so that the photomask is not easy to be damaged, and the semiconductor manufacturing process can be used during output higher efficiency can be achieved.

[0050] Refer to attached figure 1 , one embodiment of the prior art. As far as the conventional technology is concerned, there is a photomask carrying device 10, which includes a photomask support platform 14, which can provide a place for placing the photomask 12; the larger the area of ​​the support platform 14, the larger the size of the photomask 12. Larger accommodation locations can also be provided.

[0051] Refer to attached figure 2, which is one of the preferred embodiments of the present invention. The gantry-type photomask cleaning device 22 of the present invention includes two supporting devices 30 separately plac...

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Abstract

The invention discloses a gantry type light cover cleaning device which provides two supporting devices, separately places the supporting devices, then installs an air knife device between the two supporting devices and uses a controlling device to control the action of the components. When cleans, the light cover loading device is moved under the air knife device, so, the air blew by the air knife cleans the light cover. The invention not only avoids people from contacting in distance by many times, but also shortens the time for cleaning the light cover and improves the producing speed.

Description

technical field [0001] The invention belongs to the technical field of cleaning devices, and is an improvement to the present, in particular to a gantry-type device for cleaning photomasks. Background technique [0002] With the vigorous development of the semiconductor industry, wafer foundry has become one of the irreplaceable technologies in the world. In addition, the size of electronic components is getting smaller and smaller. As long as there is a small flaw in the manufacturing process, it will affect the performance of the circuit. Therefore, The cleanliness of the environment is highly required during the manufacturing process. If the quality of the product is not strictly controlled, the quality of the product will be threatened in the future. [0003] In the semiconductor manufacturing process, there is an exposure process, which is to place a mask with a pattern on top of the wafer, and then use an exposure light source to shine on a wafer through the mask, and ...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F1/00B08B11/00B08B5/02G03F1/82
Inventor 杨东晃刘耀隆
Owner CENTURY DISPLAY (SHENZHEN) CO LTD
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