Precision measurement method of nanometer clearance in nanostructure based on atomic force microscope

An atomic force microscope and nano-gap technology, which is applied to measuring devices, instruments, and electrical devices, can solve the problem of not being able to obtain the true height of the nano-suspension gap of the target structure to be measured, and achieve the effect of eliminating measurement errors and high-resolution measurement

Inactive Publication Date: 2008-11-12
TIANJIN UNIV
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Problems solved by technology

Since the damaged nanostructures can no longer be used, in the specific operation process, a batch of nanostructures with the same size are generally processed by the same process, and some of them are selected for this destructive nanosuspension gap height meas

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  • Precision measurement method of nanometer clearance in nanostructure based on atomic force microscope
  • Precision measurement method of nanometer clearance in nanostructure based on atomic force microscope
  • Precision measurement method of nanometer clearance in nanostructure based on atomic force microscope

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Embodiment Construction

[0033] The precise measurement method of the nano-gap in the nano-structure based on the atomic force microscope of the present invention will be described in detail below with reference to the embodiments and the accompanying drawings.

[0034] The method of the present invention is mainly realized based on AFM (atomic force microscope), and the elastic coefficient of the micro-cantilever beam of the atomic force microscope needs to be known. After each adjustment of the reflected laser signal of the atomic force microscope micro-cantilever, its sensitivity must be calibrated, and the calibration can be performed on the surface of a flat sample such as diamond or sapphire (hardness can be regarded as infinite).

[0035] The precise measurement method of the nano-gap in the nanostructure based on the atomic force microscope of the present invention firstly scans and measures the central area of ​​the upper surface of the sample to be tested, and positions the needle tip at the ...

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Abstract

The invention relates to a method of precision measurement of nanometer clearance of a nanometer structure based on an atomic force microscope, the method comprising: scanning the central region of a top surface of a target sample, and positioning the tip of a probe at the center of the sample; loading/unloading a vertical force with the probe of the atomic force microscope until the bottom surface of the sample contacts the substrate; and recording a force curve of the atomic force microscope during loading/unloading, so as to obtain a nanometer clearance between the bottom surface of the sample and the substrate. Specifically, the method comprises: calibrating the sensitivity of a micro cantilever of the atomic force microscope; positioning the tip of the probe of the atomic force microscope at the geometrical center of the top surface of the sample; obtaining a consistent force curve and a disjunctive force curve; comparing the slopes of the three curves including the sensitivity force curve, the consistent force curve, and the disjunctive force curve; and extracting the distance between the bottom surface of the sample and the substrate. According to the invention, measurement error due to offset of a target point from the center of a sample can be eliminated without damage on the structure of a target nanometer device, thus high-resolution measurement of nanometer clearance of nanometer structures is realized.

Description

technical field [0001] The invention relates to a measurement method for a micro / nano electromechanical system. In particular, it relates to a precision measurement method for nano-gap in nano-structures based on atomic force microscopy, which can realize non-destructive precision measurement of nano-suspension gaps in a large class of nano-structures such as nano-beams and nano-capacitance sensors based on atomic force microscope force curves. Background technique [0002] Nanoelectromechanical systems (NEMS) is an emerging technology field developed on the basis of microelectromechanical systems (MEMS), and it is also an important part of nanotechnology. Nanosuspension gaps exist in a variety of NEMS structures and devices (such as nanobeams and nanocapacitance sensors, etc.), and the precise measurement of the height of nanosuspension gaps is of great significance for evaluating the device performance and processing technology of such nanostructures. In the field of nano...

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Application Information

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IPC IPC(8): G01B7/14
Inventor 栗大超徐临燕傅星胡小唐
Owner TIANJIN UNIV
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