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Apparatus for and method of processing substrate

A substrate processing device and technology for substrates, which are applied in chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., can solve problems such as difficulty in forming different liquid flows, and inability to meet the requirements of uniformity of processing liquids at the same time. , to achieve the effect of controlling manufacturing costs

Active Publication Date: 2012-04-25
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to form different liquid flows inside the treatment tank 110 according to the treatment conditions, and it is impossible to simultaneously meet the requirements of improving the uniformity of treatment liquid treatment and effectively replacing the treatment liquid stored in the treatment tank with other treatment liquids. Require

Method used

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  • Apparatus for and method of processing substrate
  • Apparatus for and method of processing substrate
  • Apparatus for and method of processing substrate

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0064]

[0065] figure 1 It is a longitudinal cross-sectional view of the substrate processing apparatus according to the first embodiment of the present invention taken along a plane parallel to the main surface of the substrate W. FIG. exist figure 1 The structure of the control system and the liquid supply and discharge system included in the substrate processing apparatus 1 is also shown in . in addition, figure 2 It is a longitudinal cross-sectional view of the substrate processing apparatus 1 taken along a plane perpendicular to the main surface of the substrate W. FIG. exist figure 1 as well as figure 2 In , a common XYZ rectangular coordinate system is shown in order to clarify the positional relationship of the components in the device.

[0066] This substrate processing apparatus 1 is an apparatus as follows: a hydrofluoric acid (HF) solution is stored in a processing tank 10, and a plurality of substrates (hereinafter simply referred to as "substrates") ...

no. 2 approach

[0093]

[0094] Figure 10 This is a longitudinal cross-sectional view of the substrate processing apparatus 201 according to the second embodiment of the present invention cut along a plane parallel to the main surface of the substrate W. As shown in FIG. Figure 11 is a longitudinal cross-sectional view of the substrate processing apparatus 201 cut along a plane perpendicular to the principal surface of the substrate W. As shown in FIG. In order to clarify the positional relationship of each component in the device, the Figure 10 as well as Figure 11 A common XYZ Cartesian coordinate system is shown in . in addition, Figure 12 It is a diagram showing the configuration of a control system and a liquid supply and discharge system included in the substrate processing apparatus 201 . Below, refer to Figure 10 ~ Figure 12 The configuration of the substrate processing apparatus 201 will be described.

[0095] The substrate processing apparatus 201 is an apparatus that ...

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PUM

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Abstract

This invention provides a substrate processing apparatus capable of controlling the stirring of a processing liquid in a processing groove, and capable of effectively discharging extraneous matters, such as particles to the external of the processing groove. The substrate processing apparatus (1) discharges a hydrofluoric acid solution from discharge nozzles (13) toward grooves 14 formed in side walls (112a, 112b) of an inner bath (11). The hydrofluoric acid solution discharged from the discharge nozzles (13) impinges upon the grooves (14) to diffuse, thereby moving toward a top portion of the inner bath (11) in the form of low-speed uniform liquid flows. Thus, a metal component and foreign substances generated in the inner bath (11) float up toward the top portion of the inner bath (11) without being agitated within the inner bath (11), and are rapidly drained to an outer bath (12) together with the hydrofluoric acid solution.

Description

technical field [0001] The present invention relates to a substrate processing apparatus for cleaning, etching, and the like by immersing substrates such as semiconductor substrates, glass substrates for liquid crystal display devices, and glass substrates for photomasks in processing liquids. Background technique [0002] In the substrate manufacturing process, a substrate processing apparatus is used that processes the substrate by immersing the substrate in a processing liquid stored in a processing tank. Figure 18 It is a figure which shows the example of the conventional substrate processing apparatus 100. like Figure 18 As shown, the conventional substrate processing apparatus 100 has a processing tank 110 for storing a processing liquid, and while discharging the processing liquid from a discharge nozzle 113 arranged at the bottom of the processing tank 110, the processing liquid overflows from the upper part of the processing tank 110, thereby to the The processing...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/306C23F1/08B08B3/08
Inventor 大泽笃史我孙子良隆
Owner DAINIPPON SCREEN MTG CO LTD